2013 IEEE 39th Photovoltaic Specialists Conference (PVSC) 2013
DOI: 10.1109/pvsc.2013.6745175
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Ideal GaP/Si heterostructures grown by MOCVD: III-V/active-Si subcells, multijuntions, and MBE-to-MOCVD III-V/Si interface science

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Cited by 14 publications
(9 citation statements)
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“…An additional important role of the initial III-V layer on Si is to serve as effective window layer, allowing sufficient optical transmission, surface passivation, majority carrier conduction and minority carrier reflection. Emitter formation in the Si substrate can be challenging, and different approaches are being explored, such as in-situ epitaxial phosphorus diffusion (Garcia-Tabares et al 2011), in-situ epitaxial growth of Si emitter (Ringel et al 2013) and ex-situ conventional diffusion. The in-situ phosphorus diffusion from the gas phase was found to be less intense for optimal junction formation in Si (Ringel et al 2013), translating to epitaxially grown or ex-situ diffused junctions being more efficient.…”
Section: Iii-v and Si Solar Cell Design And Challengesmentioning
confidence: 99%
“…An additional important role of the initial III-V layer on Si is to serve as effective window layer, allowing sufficient optical transmission, surface passivation, majority carrier conduction and minority carrier reflection. Emitter formation in the Si substrate can be challenging, and different approaches are being explored, such as in-situ epitaxial phosphorus diffusion (Garcia-Tabares et al 2011), in-situ epitaxial growth of Si emitter (Ringel et al 2013) and ex-situ conventional diffusion. The in-situ phosphorus diffusion from the gas phase was found to be less intense for optimal junction formation in Si (Ringel et al 2013), translating to epitaxially grown or ex-situ diffused junctions being more efficient.…”
Section: Iii-v and Si Solar Cell Design And Challengesmentioning
confidence: 99%
“…The performance of the solar cell was limited by the high TDD of 9.4 Â 10 7 cm −2 , which translated to a relatively high bandgap-voltage offset, W oc of 0.73 eV (Geisz et al 2012). Ringel et al (2013) and Grassman et al (2009) have focused efforts on improving the quality of GaP/Si interface to minimize the heterovalent nucleation-related defects, including APDs, stacking faults and microtwins for structures grown by both MBE and MOCVD. Phosphorus diffusion during GaP-on-Si epitaxy was found to be inefficient in forming a diffused emitter to realize an active bottom Si subcell.…”
Section: Gaas X P 1-x Graded Buffersmentioning
confidence: 99%
“…Coolaborators at the Ohio State University have pioneered the growth of III-V cells on silicon for solar applications [2][3][4] through metamorphic structures based on graded GaAs y P 1-y or Ge y Si 1-y buffer layers (Fig. 3a).…”
Section: Metamorphic Approachesmentioning
confidence: 99%
“…Also shown is the improved infrared response of a FZ Si bottom layer cell developed for this work[2].…”
mentioning
confidence: 99%
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