2020
DOI: 10.1007/s12633-020-00392-7
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Hydrogenated Silicon Carbonitride Thin Film Nanostructuring Using SF6 Plasma: Structural and Optical Analysis

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Cited by 6 publications
(4 citation statements)
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“…This process causes a unique film deposition onto the substrate surface within the plasma reactor, known as plasma polymerization. Moreover, this technique is efficient, requiring only minimal amounts of precursor materials and consuming minimal energy (Saloum et al, 2019a;Saloum et al, 2019bSaloum et al, 2020aSaloum et al, 2020b).…”
Section: Introductionmentioning
confidence: 99%
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“…This process causes a unique film deposition onto the substrate surface within the plasma reactor, known as plasma polymerization. Moreover, this technique is efficient, requiring only minimal amounts of precursor materials and consuming minimal energy (Saloum et al, 2019a;Saloum et al, 2019bSaloum et al, 2020aSaloum et al, 2020b).…”
Section: Introductionmentioning
confidence: 99%
“…Typically, when the PECVD technique is applied to these organosilicon compounds, it yields a transparent film with a chemical structure of SiO xCyHz or SiNxCyHz (Jaritz et al, 2021;Rosace et al, 2010). Although HMDSO polymeric films have been utilized in the treatment of various fabrics (Ibrahim & Eid, 2020;Prado et al, 2022;Rosace et al, 2010;Zouari et al, 2021), HMDSN has yet to be used in fabric finishing, while it was used in other fields, where silicon organic thin films were prepared from HMDSN with different feed gases (Nitrogen and Argon), and the formed thin films had a good wettability and promising characteristics for sensing humidity of air and sensing ammonia gas (Saloum et al, 2020a).…”
Section: Introductionmentioning
confidence: 99%
“…Interest in silicon carbonitride thin films and coatings has accelerated over the last forty years due to their important chemical, electrical, optical and mechanical properties and their potential to enable new devices [1][2][3][4][5].…”
Section: Introductionmentioning
confidence: 99%
“…Plasma treatment is a powerful way to achieve hydrophilic or hydrophobic properties for polymer surfaces. The plasma atmospheres [ 15 ] to achieve hydrophilic property include O 2 [ 16 , 17 , 18 ], N 2 [ 19 ], Cl 2 [ 20 ], Ar [ 21 , 22 ], Ar/O 2 [ 23 ], Ar/N 2 [ 23 ], and O 2 /H 2 [ 24 ], while the atmospheres for hydrophobic treatment include CF 4 [ 25 ], SF 6 [ 26 ], and Ar/SF 6 [ 23 ]. Among these atmospheres, oxygen plasma is more frequently used to form hydrophilic polymer surfaces to achieve increased wettability [ 27 ] and enhanced adhesion [ 28 ] used in microfluidic devices [ 1 , 15 ], biological fields [ 29 ], and so on.…”
Section: Introductionmentioning
confidence: 99%