2013
DOI: 10.1103/physrevb.88.045319
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Hydrogen on III-V (110) surfaces: Charge accumulation and STM signatures

Abstract: The behavior of hydrogen on the 110 surfaces of III-V semiconductors is examined using ab initio density functional theory. It is confirmed that adsorbed hydrogen should lead to a charge accumulation layer in the case of InAs, but shown here that it should not do so for other related III-V semiconductors. It is shown that the hydrogen levels due to surface adsorbed hydrogen behave in a material dependent manner related to the ionicity of the material, and hence do not line up in the universal manner reported b… Show more

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Cited by 14 publications
(12 citation statements)
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“…For the current NWs, nonintentionally incorporated carbon is the main “bulk” dopant, which indeed leads to n-type doping of the NWs. , This should already suffice to explain the observed position of the Fermi level in our measurements. However, surface defects are also known to play a very significant role in the doping of NWs, not least for NWs with large surface-to-bulk ratios. , For defect-free InAs {110} surfaces, no Fermi-level pinning is observed; however in the presence of defects, Fermi-level pinning to the extent of formation of a surface 2DEG has been observed. ,, Here we point out that all these defects will be clearly observable in STM. In our case we have thus prepared our surfaces with as few defects as possible and recorded spectra as far away from any defects as could be done.…”
Section: Resultsmentioning
confidence: 63%
“…For the current NWs, nonintentionally incorporated carbon is the main “bulk” dopant, which indeed leads to n-type doping of the NWs. , This should already suffice to explain the observed position of the Fermi level in our measurements. However, surface defects are also known to play a very significant role in the doping of NWs, not least for NWs with large surface-to-bulk ratios. , For defect-free InAs {110} surfaces, no Fermi-level pinning is observed; however in the presence of defects, Fermi-level pinning to the extent of formation of a surface 2DEG has been observed. ,, Here we point out that all these defects will be clearly observable in STM. In our case we have thus prepared our surfaces with as few defects as possible and recorded spectra as far away from any defects as could be done.…”
Section: Resultsmentioning
confidence: 63%
“…[9,12] Moreover, it has been recently predicted that the transfer level  +/of a H atom adsorbed on a semiconductor's surface namely, the level at which the stable H charge switches from +1 to -1 depends on the specific material investigated, in contrast to what reported in the bulk case. [13] Even more surprising are the effects that H irradiation has on the structural, electronic, and transport properties of dilute nitrides alloys, such as Ga(AsN), Ga(PN), and (InGa)(AsN). [14] The properties of the host material are severely modified by the substitution of a small percentage of the anions with N, while they are fully recovered upon hydrogenation.…”
Section: Introductionmentioning
confidence: 99%
“…However, our work also raises the question of what other defects could be mistaken for an oxygen vacancy at the surface. One obvious candidate is hydrogen, which was recently shown to exhibit a similar STM appearance to anion vacancies at III-V semiconductor surfaces [42]. Hydrogen is a ubiquitous contaminant, with many sources, not least the dissociation of water molecules, which are usually present even under ultrahigh vacuum conditions.…”
mentioning
confidence: 99%