Abstract:This article reports on the scaling of GaN complementary technology (CT) on a silicon substrate to push its performance limits for circuit-level applications. The highly scaled self-aligned (SA) p-channel FinFET (a fin width of 20 nm) achieved an I D,max of −300 mA/mm and an R ON of 27 •mm, a record for metal organic chemical vapor deposition (MOCVD)-grown III-nitride p-FETs. A systematic study on impact of fin width scaling and recess depth in these transistors was conducted. A new SA scaled n-channel p-GaN-g… Show more
“…Nowadays, the p-GaN gate is more commonly used to obtain enhancement-mode GaN HEMTs [55]. At present, p-channel GaN field effect transistors (FETs) are attracting attention, with potential in fabricating GaN-based complementary integrated circuits [56][57][58][59].…”
Since the activation of magnesium (Mg) in p-type gallium nitride (GaN) [1,2], striking progress has been made in III-nitride materials in terms of properties, growth, and applications [3]. [...]
“…Nowadays, the p-GaN gate is more commonly used to obtain enhancement-mode GaN HEMTs [55]. At present, p-channel GaN field effect transistors (FETs) are attracting attention, with potential in fabricating GaN-based complementary integrated circuits [56][57][58][59].…”
Since the activation of magnesium (Mg) in p-type gallium nitride (GaN) [1,2], striking progress has been made in III-nitride materials in terms of properties, growth, and applications [3]. [...]
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.