Proceedings of 35th European Solid-State Device Research Conference, 2005. ESSDERC 2005.
DOI: 10.1109/essder.2005.1546651
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High work-function metal gate and high-k dielectrics for charge trap flash memory device applications

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Cited by 3 publications
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“…[ 12 , 13 ] The CTM mechanism is identical to the charge‐trap flash (CTF) memory, in which reversible charge trapping and de‐trapping to the charge trap layer alter the threshold voltage of the transistor. [ 14 , 15 , 16 ] Unlike the three‐terminal CTF, the two‐terminal CTM directly reads the conductance change through the charge trap layer, allowing higher density and simpler operation. [ 17 , 18 , 19 ] However, as the programming and reading operations share identical terminals, there is a contradiction between the stability of the trapped charges (i.e., retention) and the reliability of the programming process (i.e., writing or erasing).…”
Section: Introductionmentioning
confidence: 99%
“…[ 12 , 13 ] The CTM mechanism is identical to the charge‐trap flash (CTF) memory, in which reversible charge trapping and de‐trapping to the charge trap layer alter the threshold voltage of the transistor. [ 14 , 15 , 16 ] Unlike the three‐terminal CTF, the two‐terminal CTM directly reads the conductance change through the charge trap layer, allowing higher density and simpler operation. [ 17 , 18 , 19 ] However, as the programming and reading operations share identical terminals, there is a contradiction between the stability of the trapped charges (i.e., retention) and the reliability of the programming process (i.e., writing or erasing).…”
Section: Introductionmentioning
confidence: 99%