Abstract:This work shows an alternative surface cleaning method for c-Si wafers to replace the standard chemical procedures as RCA or HNO 3 which involve hazardous chemicals or unstable processes. The method consists in a high-temperature oxidation treatment (HTO) performed in a classical tube furnace that incorporates organic and metal particles present on the c-Si surfaces in the growing SiO 2 layer. The result is as a reliable pre-treatment method for obtaining less defective c-Si surfaces ready for solar cell fabri… Show more
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.