High temperature oxidation of zirconium and zircaloy-4 under applied load: Nuclear microprobe study of the growth of the oxide

Berger, Pascal; Tahhann, R. El; Moulin, Gérard; Viennot, Marc

doi:10.1016/s0168-583x(03)01089-9

Cited by 12 publications

(4 citation statements)

References 12 publications

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“…However, its poor oxidation resistance can lead to its failure under loss of coolant conditions [1][2][3]. a-Zirconium (a-Zr) maintains an HCP structure to temperatures as high as 850°C.…”

Section: Introductionmentioning

confidence: 99%

Reactivity of Zircaloy-4 with Ti3SiC2 and Ti2AlC in the 1100–1300 °C temperature range

Tallman

Yang

Pan

et al. 2015

Journal of Nuclear Materials

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h i g h l i g h t sThe diffusion bonding of Ti 3 SiC 2 and Ti 2 AlC to Zircaloy-4 cladding was investigated. Si penetration into the Zr-4 was roughly an order of magnitude less than that of Al. The resultant bonds using Ti 2 AlC were weak and full of cracks. The Ti 3 SiC 2 /Zr-4 bonds were stronger, and withstood the forces of sectioning. a b s t r a c tHerein, we report on the interactions between zirconium, in the form of Zircaloy-4 (Zr-4) and the MAX phases, Ti 3 SiC 2 and Ti 2 AlC in the 1100-1300°C range. In both cases, the A-group element, Al or Si, diffused out of the MAX phases and formed intermetallics with the Zr-4. Under comparable conditions, Si penetration into the Zr-4 was roughly an order of magnitude less than that of the Al from the Ti 2 AlC. The effective diffusion coefficient of Si can be described by D eff Si m 2 s ¼ 7:4 Â 10 À9 exp À170 kJ=mol RT ð Þ ; that of Al by D eff Al m 2 s ¼ 9:3 Â 10 À12 exp À38 kJ=mol RT ð Þ . At 38 kJ/mol, the activation energy for the Ti 2 AlC/Zr-4 diffusion bonding process was significantly lower than that of the Ti 3 SiC 2 /Zr-4 diffusion couples, at 170 kJ/mol.

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“…However, its poor oxidation resistance can lead to its failure under loss of coolant conditions [1][2][3]. a-Zirconium (a-Zr) maintains an HCP structure to temperatures as high as 850°C.…”

Section: Introductionmentioning

confidence: 99%

Reactivity of Zircaloy-4 with Ti3SiC2 and Ti2AlC in the 1100–1300 °C temperature range

Tallman

Yang

Pan

et al. 2015

Journal of Nuclear Materials

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“…Zry-4 has been of great concern and investigated with a variety of surfaces in many fields. The corrosion, [3][4][5][6][7][8][9] oxidation, [10][11][12][13][14][15][16][17] and hydrogen absorption kinetics [18][19][20][21][22][23] of Zry-4 and its nuclear application have been reported in literatures. Zry-4 oxidation by water (H2O) and steam has been reported in many studies.…”

Section: Introductionmentioning

confidence: 99%

Surface Phenomena of Deuterized Ethanol Exposed Zircaloy-4 Surfaces

Park¹,

Jung²,

Chun³

et al. 2009

Bulletin of the Korean Chemical Society

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We report the results of the surface chemistry of deuterized ethanol exposed Zircaloy-4 (Zry-4) surfaces with various amount of C2D5OD exposures at 190 K. This system was examined with Auger electron spectroscopy (AES) and temperature programmed desorption (TPD) techniques. In TPD study, D2 was evolved at two different desorption temperature regions accompanying with broad desorption background. The lower temperature feature at around 520 K showed first-order desorption kinetics. The high temperature desorption peak at around 650 K shifted to lower desorption temperature as the exposure of C2D5OD increased. The Zr(MNV) Auger peak shifted about 2.5 eV from 147 eV to lower electron energy followed by 300 L of C2D5OD dosing. This implies metallic zirconium was oxidized by deuterized ethanol adsorption. After stepwise annealing of the oxidized Zry-4 sample up to 843 K, the shifted Zr(MNV) peak was gradually shifted back to metallic zirconium peak position. After the sample was heated to 843 K, the oxygen content near the Zry-4 surface was recovered to clean surface level. The concentration of carbon, however, was not recovered by annealing the sample.

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“…The corrosion, 1-4 oxidation [5][6][7][8] or hydrogen absorption kinetics [9][10][11][12] of Zry-4 and its nuclear applications have been of great concern and investigated with a variety of surface science techniques in the literatures. Zry-4 oxidation by water (H 2 O) and steam environments has been reported in numerous studies.…”

Section: Introductionmentioning

confidence: 99%

The Effects of Ar-ion Bombardment and Annealing of D₂O/Zircaloy-4 Surfaces Using XPS and UPS

Oh¹,

Kang

2007

Bulletin of the Korean Chemical Society

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The surface chemistry of D 2 O dosed Zircaloy-4 (Zry-4) surface followed by Ar-ion bombardment and annealing was studied by means of X-ray photoelectron spectroscopy (XPS) and Ultraviolet photoelectron spectroscopy (UPS). In the XPS study, Ar-ion bombardment caused decrease of the oxygen on the surface region of Zry-4 and therefore led to change the oxidation states of the zirconium from oxide to metallic form. In addition, oxidation states of zirconium were changed to lower oxidation states of zirconium due to depopulation of oxygen on the surface region by annealing. Up to about 787 K, the bulk oxygen diffused out to the subsurface region and after this temperature, the oxygen on the surface of Zry-4 was depopulated. UPS study showed that the valence band spectrum of the D 2 O exposed Zry-4 exhibited a dominant peak at around 13 eV and no clear Fermi edge was detected. After stepwise Ar + sputtering processes, the decrease of the oxygen on the surface of Zry-4 led to suppress the dominant peak around 13 eV, the peak around 9 eV and develop a new peak of the metallic Zr 4d state (20.5-21.0 eV) at the Fermi level.

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High temperature oxidation of zirconium and zircaloy-4 under applied load: Nuclear microprobe study of the growth of the oxide

Cited by 12 publications

References 12 publications

Reactivity of Zircaloy-4 with Ti3SiC2 and Ti2AlC in the 1100–1300 °C temperature range

Reactivity of Zircaloy-4 with Ti3SiC2 and Ti2AlC in the 1100–1300 °C temperature range

Surface Phenomena of Deuterized Ethanol Exposed Zircaloy-4 Surfaces

The Effects of Ar-ion Bombardment and Annealing of D₂O/Zircaloy-4 Surfaces Using XPS and UPS

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High temperature oxidation of zirconium and zircaloy-4 under applied load: Nuclear microprobe study of the growth of the oxide

Cited by 12 publications

References 12 publications

Reactivity of Zircaloy-4 with Ti3SiC2 and Ti2AlC in the 1100–1300 °C temperature range

Reactivity of Zircaloy-4 with Ti3SiC2 and Ti2AlC in the 1100–1300 °C temperature range

Surface Phenomena of Deuterized Ethanol Exposed Zircaloy-4 Surfaces

The Effects of Ar-ion Bombardment and Annealing of D2O/Zircaloy-4 Surfaces Using XPS and UPS

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The Effects of Ar-ion Bombardment and Annealing of D₂O/Zircaloy-4 Surfaces Using XPS and UPS