IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest.
DOI: 10.1109/iedm.2005.1609477
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High-speed blue-, red-, and infrared-sensitive photodiode integrated in a 0.35 μm SiGe:C-BiCMOS process

Abstract: A monolithically integrated photodiode with SiGe:C anode, which exhibits an excellent spectral responsivity of typically 0.21/0.42/0.53 A/W at 410/660/785nm and sub-ns rise/fall times, fabricated without process modification is presented. The bandwidth of the photodiode exceeds 1300/490/260MHz at 410/660/785nm favoring this device for universal optical storage applications. By applying a reverse bias voltage up to 10 V the photodiode features responsivities up to 0.6 A/W for 410nm due to avalanche multiplicati… Show more

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Cited by 4 publications
(4 citation statements)
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“…5) Table I tabulates the comparison among a couple of detectors in BiCMOS processes reported in recent years for optical storage application. 3,4) Nemecek et al reported the pure-Si p-i-n diode with 17 V operating voltage. 3) By comparing the p-i-n photodiode with PTPD, the former needs larger detecting region and higher bias voltage than the latter.…”
Section: Characterization and Discussionmentioning
confidence: 99%
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“…5) Table I tabulates the comparison among a couple of detectors in BiCMOS processes reported in recent years for optical storage application. 3,4) Nemecek et al reported the pure-Si p-i-n diode with 17 V operating voltage. 3) By comparing the p-i-n photodiode with PTPD, the former needs larger detecting region and higher bias voltage than the latter.…”
Section: Characterization and Discussionmentioning
confidence: 99%
“…The responsivity of the latter is higher than that of the former. In Meinhardt's research, 4) the conventional PT degenerated into a photodiode. Blue light could be absorbed by a simple BC junction but could not be further amplified.…”
Section: Characterization and Discussionmentioning
confidence: 99%
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“…Our SiGe:C BiCMOS process offers some opportunities to solve this problem and all modifications affect only mask layouts and leave the fabrication process itself unchanged (23). A very effective way to extend the applicability over the entire visible range is to make use of the double diode (DPD) concept proposed in (2).…”
Section: Hbt Subcollector Layout Modifications For Increased Red/ir-s...mentioning
confidence: 99%