2016
DOI: 10.1109/ted.2015.2441774
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High-Sensitivity Image Sensors Overlaid With Thin-Film Gallium Oxide/Crystalline Selenium Heterojunction Photodiodes

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Cited by 22 publications
(10 citation statements)
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“…Based on previous studies, heat treatment could accelerate the transformation of amorphous selenium to crystalline selenium, and Imura et al . have successfully prepared polycrystalline films consisting of nanoparticles by in situ thermal treatment for photodetector applications . The preferable growth of 1D Se nanorods is kinetically favored, since the binding energy of Se atoms along the c -axis is much higher than that along the ⟨12̅10⟩ directions .…”
Section: Resultsmentioning
confidence: 99%
“…Based on previous studies, heat treatment could accelerate the transformation of amorphous selenium to crystalline selenium, and Imura et al . have successfully prepared polycrystalline films consisting of nanoparticles by in situ thermal treatment for photodetector applications . The preferable growth of 1D Se nanorods is kinetically favored, since the binding energy of Se atoms along the c -axis is much higher than that along the ⟨12̅10⟩ directions .…”
Section: Resultsmentioning
confidence: 99%
“…Next, a crystallization transition displays the various diffraction peaks in XRD patterns after annealing at 62 °C, corresponding to the darker color shown in practicality photographs. The darker color property of the polycrystalline Se (p-Se) is due to the strong optical absorptions in the visible range of long wavelengths [13], which will also be evidenced in the transmittance analysis section. It can be seen that the crystallization temperature at 62 °C for a-Se thin films is higher than for those of a-Se thick films [11,12], which is attributed to the significant influence from substrate surface.…”
Section: Resultsmentioning
confidence: 99%
“…Avalanche multiplication was first observed in a c-Sebased film fabricated on a glass substrate at a relatively low applied voltage, which exhibits high external quantum efficiency of over 100% 19) . However, avalanche multiplication could not be observed on pixel circuits with a silicon substrate 20) . This paper is organized as follows.…”
Section: Introductionmentioning
confidence: 94%
“…A 300-nm-thick a-Se film was deposited in vacuum on the sensor chip, and it was annealed at 200 °C to convert a-Se to c-Se. A 20-nm-thick n-Ga 2O 3 film was then formed by RF magnetron sputtering, and a 30-nm-thick ITO film was deposited on it by DC magnetron sputtering 20) . Table 1 multiplication is thought to be avalanche multiplication.…”
Section: Mechanism Of Generation Of Large Spot Noisementioning
confidence: 99%