High-resolution templates for step and flash imprint lithography

Resnick, Douglas J.; Dauksher, William J.; Mancini, David P.; Nordquist, Kevin J.; Ainley, Eric S.; Gehoski, Kathleen A.; Baker, J.; Bailey, Todd; Choi, Byung Jin; Johnson, Stephen C.; Sreenivasan, S. V.; Ekerdt, John G.; Willson, C. Grant

doi:10.1117/12.472293

Cited by 44 publications

(10 citation statements)

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“…The smallest features transferred into a silicon mold are ∼10-nm wide lines written using electron-beam lithography . The smallest features produced in a quartz mold are 20 nm. − …”

Section: 1 Hard Pattern Transfer Elementsmentioning

confidence: 99%

New Approaches to Nanofabrication: Molding, Printing, and Other Techniques

et al. 2005

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“…The smallest features transferred into a silicon mold are ∼10-nm wide lines written using electron-beam lithography . The smallest features produced in a quartz mold are 20 nm. − …”

Section: 1 Hard Pattern Transfer Elementsmentioning

confidence: 99%

New Approaches to Nanofabrication: Molding, Printing, and Other Techniques

et al. 2005

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“…SFIL is more suitable than NIL for fabricating structures consisting of multiple stacked layers, because, due to the transparency of the mold, layer alignment is easier with SFIL. Furthermore, because of the milder molding conditions of SFIL, the shaped layers do not need to undergo large temperature changes for each subsequent layer, as is the case with NIL . Photocurable low‐viscous acrylate‐based precursors and biomaterials can be used as resists.…”

Section: Fabrication Methods For 3d Structures With Areas Of Various mentioning

confidence: 99%

Nanostructure and Microstructure Fabrication: From Desired Properties to Suitable Processes

Assenbergh

Meinders²,

Geraedts

et al. 2018

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When designing a new nanostructure or microstructure, one can follow a processing-based manufacturing pathway, in which the structure properties are defined based on the processing capabilities of the fabrication method at hand. Alternatively, a performance-based pathway can be followed, where the envisioned performance is first defined, and then suitable fabrication methods are sought. To support the latter pathway, fabrication methods are here reviewed based on the geometric and material complexity, resolution, total size, geometric and material diversity, and throughput they can achieve, independently from processing capabilities. Ten groups of fabrication methods are identified and compared in terms of these seven moderators. The highest resolution is obtained with electron beam lithography, with feature sizes below 5 nm. The highest geometric complexity is attained with vat photopolymerization. For high throughput, parallel methods, such as photolithography (≈10 m h ), are needed. This review offers a decision-making tool for identifying which method to use for fabricating a structure with predefined properties.

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“…After contacting this mold with a low -viscosity, photocurable polymer, the polymer is held under UV light. With this method, features as small as 30 nm can be produced [54] . The strengths of this approach are the rapid cyclic time ( < 5 min/replication) and the ability of optical mold alignment with features on the underlying surface [53,55] .…”

Section: Soft Lithographymentioning

confidence: 99%