High-power laser interference lithography process on photoresist: Effect of laser fluence and polarisation

Ellman, Miguel; Rodríguez, Ainara; Pérez, Noemí; Echeverría, Mikel; Verevkin, Yu K; Peng, Changsi; Berthou, Thierry; Wang, Z.; Olaizola, Santiago M.; Ayerdi, I.

doi:10.1016/j.apsusc.2008.07.201

Cited by 39 publications

(21 citation statements)

References 13 publications

(11 reference statements)

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“…The beams for holography arrangements are split and can be collected by using the beamsplitters ( Fig. 3(a)) [16,17], the diffractive optical element (DOE) with a confocal focusing system ( Fig. 3(b)) [18,19], the liquid-crystal spatial light modulator (LC-SLM) ( Fig.…”

Section: Experimental Set-ups Of Holographic Lithography and Their Fementioning

confidence: 99%

Fabrication of periodic micro-structures by holographic lithography

Stankevičius¹,

Gedvilas²,

Voisiat³

et al. 2013

Lith. J. Phys.

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The principles of the holographic lithography technique are reviewed, and the ability in the formation of structures with different periods by the holographic lithography technique in SZ2080 is demonstrated. The influence of laser exposure, phase shift between interfering laser beams, and the used laser wavelength on the structures fabricated by the four-beam interference technique has been studied. It is shown that by using the interfering beams with a different phase is it possible to reduce the period of the structure √ − 2 times compared to the four interfering beams of the same phase. Fabrication of micro-structures by the holographic lithography technique can be realized via multi-photon and single-photon polymerization processes. The structures created by these two techniques are compared. Finally, in the experiments with the five-beam interference, the doubleperiod effect was observed by adding the zero-order beam with a low intensity. The fabricated periodic microstructures have the potential to be used as a scaffold for cell growth and micro-optics.

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Section: Experimental Set-ups Of Holographic Lithography and Their Fementioning

confidence: 99%

Fabrication of periodic micro-structures by holographic lithography

Stankevičius¹,

Gedvilas²,

Voisiat³

et al. 2013

Lith. J. Phys.

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show abstract

“…Given the numerous periodic patterning and motif geometry possibilities afforded by MBI, significant research has focused on maximizing the absolute contrast of the interference pattern by optimized selection of individual beam amplitudes, polarizations, and phases [60][61][62][63][64][65][66][67]. In this effort, the concept of uniform contrast was introduced, in which the relative amplitudes and individual-beam polarizations are optimized to ensure the highest contrast of the pattern as a whole for three- [68][69][70] and four-beam interference [71,72].…”

Section: Advances In Multi-beam Interference Periodic Patterningmentioning

confidence: 99%

Multi-Beam Interference Advances and Applications: Nano-Electronics, Photonic Crystals, Metamaterials, Subwavelength Structures, Optical Trapping, and Biomedical Structures

Burrow

Gaylord

2011

Micromachines

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Abstract:Research in recent years has greatly advanced the understanding and capabilities of multi-beam interference (MBI). With this technology it is now possible to generate a wide range of one-, two-, and three-dimensional periodic optical-intensity distributions at the micro-and nano-scale over a large length/area/volume. These patterns may be used directly or recorded in photo-sensitive materials using multi-beam interference lithography (MBIL) to accomplish subwavelength patterning. Advances in MBI and MBIL and a very wide range of applications areas including nano-electronics, photonic crystals, metamaterials, subwavelength structures, optical trapping, and biomedical structures are reviewed and put into a unified perspective.

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“…It is currently the only maskless technology that provides high throughput and low cost for 3D nano patterning over large sample areas [1][2][3][4][5].…”

Section: Introductionmentioning

confidence: 99%

Determination of two-dimensional phase shifts in three-beam laser interference patterns

Lei

Wang

et al. 2012

2012 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3m-Nano)

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This paper describes a method of determining twodimensional phase shifts. In this method, the two-dimensional phase shift is divided into horizontal and vertical components, and each component of the phase shift is determined by pattern correlation, Pythagorean theorem and linear interpolation with subpixel accuracy. The computer simulation and experiment have shown that the method is useful for the determination of phase difference between two three-beam interference patterns. The method can also be used to determine the phase shift in other multi-beam interference patterns. IndexTerms-Laser interference lithography, twodimensional phase shift, correlation coefficient.

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High-power laser interference lithography process on photoresist: Effect of laser fluence and polarisation

Cited by 39 publications

References 13 publications

Fabrication of periodic micro-structures by holographic lithography

Fabrication of periodic micro-structures by holographic lithography

Multi-Beam Interference Advances and Applications: Nano-Electronics, Photonic Crystals, Metamaterials, Subwavelength Structures, Optical Trapping, and Biomedical Structures

Determination of two-dimensional phase shifts in three-beam laser interference patterns

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