1985
DOI: 10.1109/t-ed.1985.22274
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High-power GaAs FET's prepared by ion implantation

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Cited by 7 publications
(1 citation statement)
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“…factor of 50 % for the MOCVD wafer. Furthermore, the performance comparison between ion-implanted and MOCVD wafers has also been performed by Toshiba [3], [4]. +The cross section of the ion-implanted FET chip is shown in Fig.…”
Section: Fet Ciiip Desighn and Fabricationmentioning
confidence: 99%
“…factor of 50 % for the MOCVD wafer. Furthermore, the performance comparison between ion-implanted and MOCVD wafers has also been performed by Toshiba [3], [4]. +The cross section of the ion-implanted FET chip is shown in Fig.…”
Section: Fet Ciiip Desighn and Fabricationmentioning
confidence: 99%