2022
DOI: 10.1021/acsanm.2c02969
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High-Photoresponse and Broad-Band Graphene/WS2/Porous-Si Heterostructure Photodetectors

Abstract: Formation of pores on Si wafer as an effective approach to enhance the light absorption of Si is attractive for graphene (GR)-based-heterojunction optoelectronic devices such as GR/porous Si (PSi) photodetectors (PDs), but the misalignment at the GR/PSi interface limits further enhancement of the PDs’ performance. Here, we first employ WS2 as an interfacial layer between GR and PSi to fabricate GR/WS2/PSi heterojunction PDs exhibiting a broad-band photoresponse in the visible range, originating from the enlarg… Show more

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Cited by 5 publications
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“…The typical current-voltage (I-V) characteristic curves in the dark state are shown in Figure 2b, with digital photographs of the devices displayed in the insets. Both devices exhibit excellent rectification behavior, with rectification ratios of up Graphene/porous Si 0.22(600 nm) @−1 V ≈10 4 25 mm 2 [32] Graphene/ Si nanowire 0.15(365) @0 V ≈10 2 0.1/0.3 ms [33] Graphene/Si 0.73(890 nm) ≈10 6 0.32/0.75 s 10 mm 2 [34] Graphene/Si 0.635(850 nm) @−2 V ≈10 3 / <1 mm 2 [17] Graphene/Si 0.43(900 nm) @−2 V ≈10 4 1.2/3 ms 0.005 mm 2 [35] Graphene/WS 2 /Si 0.7(800 nm) @−0. to 10 5 (Figure 2c) and turn-on currents in the order of mA at 5 V voltage.…”
Section: Resultsmentioning
confidence: 99%
“…The typical current-voltage (I-V) characteristic curves in the dark state are shown in Figure 2b, with digital photographs of the devices displayed in the insets. Both devices exhibit excellent rectification behavior, with rectification ratios of up Graphene/porous Si 0.22(600 nm) @−1 V ≈10 4 25 mm 2 [32] Graphene/ Si nanowire 0.15(365) @0 V ≈10 2 0.1/0.3 ms [33] Graphene/Si 0.73(890 nm) ≈10 6 0.32/0.75 s 10 mm 2 [34] Graphene/Si 0.635(850 nm) @−2 V ≈10 3 / <1 mm 2 [17] Graphene/Si 0.43(900 nm) @−2 V ≈10 4 1.2/3 ms 0.005 mm 2 [35] Graphene/WS 2 /Si 0.7(800 nm) @−0. to 10 5 (Figure 2c) and turn-on currents in the order of mA at 5 V voltage.…”
Section: Resultsmentioning
confidence: 99%