2023
DOI: 10.1002/adom.202301982
|View full text |Cite
|
Sign up to set email alerts
|

Ultra‐High Responsivity Black‐Si/Graphene Heterojunction Photodetectors Enabled by Enhanced Light Absorption and Local Electric Fields

Shuren Zhou,
Haodong Fan,
Shaofeng Wen
et al.

Abstract: Photodetectors with high responsivity, fast response, and broad spectral response are of great importance for a wide range of applications in fundamental science and various industries. However, conventional photodiodes operating at low bias voltage do not provide any gain. The graphene (Gr)/Si van der Waals heterostructure, on the other hand, offers a potential gain due to the limited density of states near the Dirac point. In this work, a highly photoresponsive broadband pyramidal black‐Si/Gr heterojunction … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2024
2024
2024
2024

Publication Types

Select...
2

Relationship

2
0

Authors

Journals

citations
Cited by 2 publications
(2 citation statements)
references
References 44 publications
(55 reference statements)
0
2
0
Order By: Relevance
“…To expose Si within the defined area, a reactive plasma etching technique (SHL 100u-RIE) was employed to etch the SiO 2 layer. Subsequently, the exposed Si was etched into pyramids using an alkali etching method . Following this, a top electrode consisting of a Cr (5 nm)/Au (50 nm) layer was deposited on the SiO 2 surrounding the pyramidal-Si structure via thermal evaporation and photolithography.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…To expose Si within the defined area, a reactive plasma etching technique (SHL 100u-RIE) was employed to etch the SiO 2 layer. Subsequently, the exposed Si was etched into pyramids using an alkali etching method . Following this, a top electrode consisting of a Cr (5 nm)/Au (50 nm) layer was deposited on the SiO 2 surrounding the pyramidal-Si structure via thermal evaporation and photolithography.…”
Section: Methodsmentioning
confidence: 99%
“…Generally, Schottky or p–n photodiodes lack gain unless avalanche breakdown occurs, thereby limiting the highest achievable responsivity. Recently, we achieved an ultrahigh photoresponsivity of 1.38 × 10 3 A/W by employing a graphene/black-Si heterostructure . The pyramidal black-Si with nanoporous material not only enhanced light absorption but also augmented the local electrical fields.…”
Section: Introductionmentioning
confidence: 99%