2017
DOI: 10.1039/c7tc03794e
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High mobility solution-processed C8-BTBT organic thin-film transistors via UV-ozone interface modification

Abstract: UV-ozone exposure directly on the dielectric surface to get an OTFT mobility as high as 6.50 cm2(V s)−1.

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Cited by 38 publications
(41 citation statements)
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“…Although the latter has been formerly perceived as an intrinsic material property, more recent research results highlight the importance of material processing and the effectiveness of process optimization for the increase of transistor mobility. [23] In another study, improved performance in this C8-BTBT:PMMA blend system has been shown to be triggered by aforementioned zone-refinement effect, also referred to as in situ purification. [21] Enhanced intergrain connectivity, reduced density of interface traps and energetic disorder, and a zone-refinement effect were suggested as possible mechanisms for how the addition of PS yields improved charge carrier mobilities.…”
Section: Introductionmentioning
confidence: 87%
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“…Although the latter has been formerly perceived as an intrinsic material property, more recent research results highlight the importance of material processing and the effectiveness of process optimization for the increase of transistor mobility. [23] In another study, improved performance in this C8-BTBT:PMMA blend system has been shown to be triggered by aforementioned zone-refinement effect, also referred to as in situ purification. [21] Enhanced intergrain connectivity, reduced density of interface traps and energetic disorder, and a zone-refinement effect were suggested as possible mechanisms for how the addition of PS yields improved charge carrier mobilities.…”
Section: Introductionmentioning
confidence: 87%
“…[24] Moreover, peak values of 9.1 cm 2 V −1 s −1 were reported for the same blend after recrystallization via solvent-vapor-annealing (SVA). [5,14,23,27,28] This behavior is considered to be caused by gate-voltage-dependent contact resistance, and makes a consistent extraction of mobility values very difficult, rendering a direct comparison of reported mobilities challenging and of limited usefulness. In particular, a mobility of 9.2 cm 2 V −1 s −1 has been extracted from blade-cast devices, prepared by a similar technology as utilized in our work.…”
Section: Introductionmentioning
confidence: 99%
“…For example, by optimizing the spinning speed and improving the wettability of SiO 2 via UV–ozone treatment, Saiki's group obtained the highest mobility at 2.6 cm 2 V −1 s −1 on SiO 2 . By optimizing the dielectric wettability via controlling the UV–ozone treatment period, Liu's group obtained the highest mobility at 6.5 cm 2 V −1 s −1 on SiO 2 at the fixed spinning speed of 2000 rpm . Here, we not only optimized the spinning speed, but also applied a C‐PVA dielectric to provide a more suitable surface for spin‐coating.…”
mentioning
confidence: 99%
“…Here, we not only optimized the spinning speed, but also applied a C‐PVA dielectric to provide a more suitable surface for spin‐coating. Despite the films with step‐and‐terrace layer structures appearing both on SiO 2 and C‐PVA (Figure S7, Supporting Information), the films on the C‐PVA dielectric showed a smaller roughness, which is more beneficial for increasing the carrier mobility . Obvious holes and discontinuous grains can be observed for the C8‐BTBT thin film deposited on the SiO 2 dielectric.…”
mentioning
confidence: 99%
“…2d). It is known that the smaller the value of FWHM, the higher the crystal quality [11,33,34]. Judging from the XRD measurements, a low withdrawal speed during dip-coating resulted in high crystallinity [35][36][37][38].…”
Section: Resultsmentioning
confidence: 99%