2008
DOI: 10.1016/j.jnoncrysol.2007.09.087
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High interfacial conductivity at amorphous silicon/crystalline silicon heterojunctions

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Cited by 23 publications
(18 citation statements)
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“…12.23 for the current flow, the upper first path consisting in the flow within the a-Si:H layer is negligible. This has been verified experimentally by comparing the current measured in the a-Si:H/c-Si structure with that measured in the a-Si:H/glass structure [66,67]. An example is shown in Fig.…”
Section: Planar Conductance Techniquesupporting
confidence: 54%
“…12.23 for the current flow, the upper first path consisting in the flow within the a-Si:H layer is negligible. This has been verified experimentally by comparing the current measured in the a-Si:H/c-Si structure with that measured in the a-Si:H/glass structure [66,67]. An example is shown in Fig.…”
Section: Planar Conductance Techniquesupporting
confidence: 54%
“…Recently, there has been experimental confirmation of the existence of the inversion layer using capacitive methods, 9,10 planar conductivity measurements, [11][12][13] and conductive probe atomic force microscopy. 14,15 Until now, the inversion layer has been considered only as a tool to characterize the band offsets at the a-Si:H/c-Si interface 16,17 and its influence on lateral transport in operating devices has not yet been analyzed.…”
Section: Introductionmentioning
confidence: 99%
“…The method is based on the existence of a strongly inverted layer in the crystalline material at the interface if a highly doped (n) a-Si:H layer is deposited on a (p) c-Si substrate [5,6], or for the inverted structure [7]. This forms a conductive channel that strongly depends on the band bending and thus on the band offsets.…”
Section: Introductionmentioning
confidence: 99%