1997 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium. Digest of Technical Papers
DOI: 10.1109/rfic.1997.598732
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High gain, high efficiency, low voltage, medium power Si-bipolar transistor suitable for integration

Abstract: Medium power transistors in a high performance double polysillicon bipolar process have been fabricated. On-wafer loadpull measurements show high gain (15 dB) and high maximum efficiency (60%) at 1.8 GHz with 27 dBm of output power. These results were obtained with a low supply voltage of 3.5 V. More importantly, these results were obtainedl with transistors with a buried layer having a collector contact at the tolp, which makes it possible to integrate power ampliiers on chip.

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Cited by 3 publications
(1 citation statement)
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“…Because of the low breakdown voltages for fast CMOS devices, other technologies, such as GaAs HBT [26], [27], Si bipolar [28], [29], SiGe HBT [30]- [32], and low-voltage LDMOS [33], [34], have so far dominated the small-size PAs. See [35] for CMOS vs. GaAs comparison for mobile phone PAs, and [36] for comparison of different bipolar technologies for similar applications.…”
Section: A Cmos For Wireless Socmentioning
confidence: 99%
“…Because of the low breakdown voltages for fast CMOS devices, other technologies, such as GaAs HBT [26], [27], Si bipolar [28], [29], SiGe HBT [30]- [32], and low-voltage LDMOS [33], [34], have so far dominated the small-size PAs. See [35] for CMOS vs. GaAs comparison for mobile phone PAs, and [36] for comparison of different bipolar technologies for similar applications.…”
Section: A Cmos For Wireless Socmentioning
confidence: 99%