2004
DOI: 10.1016/j.jcrysgro.2003.11.026
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High-efficiency metamorphic GaInP/GaInAs/Ge solar cells grown by MOVPE

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Cited by 53 publications
(25 citation statements)
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“…The 660 nm luminescence increases, as expected, as the beam enters the GaInP cell, decreases (but does not reach the background level) in the GaInAs middle cell, and then increases again in the BSF and TJ regions, which contain GaInP [7], before dropping to the background level in the Ge. An 880 nm signal is produced by excitation both in the GaInP as well as the GaInAs.…”
Section: Experimental Results: Cathodoluminescence and Near-fieldsupporting
confidence: 78%
See 1 more Smart Citation
“…The 660 nm luminescence increases, as expected, as the beam enters the GaInP cell, decreases (but does not reach the background level) in the GaInAs middle cell, and then increases again in the BSF and TJ regions, which contain GaInP [7], before dropping to the background level in the Ge. An 880 nm signal is produced by excitation both in the GaInP as well as the GaInAs.…”
Section: Experimental Results: Cathodoluminescence and Near-fieldsupporting
confidence: 78%
“…High-resolution spectroscopy techniques are required to study these multilayer systems. While a majority of CL work on multijunction cells has focused on defect mapping [7], [8] or studies of radiation damage [9], [10], transport imaging has the potential to provide important corollary information and directly evaluate materials properties, image interface, and junction recombination behavior and observe and quantify luminescent coupling. …”
Section: Introductionmentioning
confidence: 99%
“…When TDD is lower than 10 5 cm −2 , the decreasing trend of η is not obvious, and the drastic drop occurs after TDD is beyond this critical value. According to the recent experiments [1][2][3][4][5][6][7][8][9], there is an approximate order of magnitude 10 5 -10 7 cm −2 of TD coming up to the device surface, which still greatly degrades the cell's performance as observed in Figure 4. Therefore, to maintain an expecting η, TDD in the MM system had better be reduced to less than 10 5 cm −2 , indicating a need of high quality buffer layer.…”
Section: Resultsmentioning
confidence: 99%
“…Generally, the proper buffer layer is inserted within the heteroepitaxial layers to relax the misfit strain and bury those defects under the active layers. Although huge efforts were made [1][2][3][4][5][6][7][8][9], there is still non-ignorable density of TD of the order 10 5 -10 7 cm −2 , propagating into the active layers. Thus, a competition between a high η of the MM structure and unexpected negative impaction brought by dislocation must be reconciled within the same configuration.…”
Section: Introductionmentioning
confidence: 99%
“…This direct and wide band gap spectrum makes the InGaN material system applicable for photovoltaic device design [4][5]. GaInP-GaInAs-Ge which has three junctions has a performance of %39, but structures containing InGaN has better efficiency [6][7]. SC with InGaN active layer is an important nanotechnology device which takes attention in recent years.…”
Section: Introductionmentioning
confidence: 99%