“…There are several technological processes of chemical surface treatment of silicon, while the most commonly used technological processes currently are electrochemical etching, stain etching, metal-assisted chemical etching, reactive ion etching, surface structure chemical transfer (SSCT), anisotropic wet etching, etc [4][5][6][7][8]. The result of these technological processes are different structures (porous structure, pyramidal structure, nanocrystalline structure) with different properties.…”