High-brightness laser-induced EUV source based on tin plasma with an unlimited lifetime of electrodes

Vinokhodov, A Yu; Krivtsun, V. M.; Lash, A. A.; Borisov, V. M.; Yakushev, O. F.; Koshelev, K. N.

doi:10.1070/qe2016v046n01abeh015657

Cited by 9 publications

(9 citation statements)

References 3 publications

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“…Compared to traditional power supply, this system can control the generation and process of discharge at a required time by changing the delay between laser and voltage. Figure 2 shows the schematic diagram of the power supply based on three-level magnetic pulse compression, which differs from conventional LTD sources [20]. Figure 3 illustrates the time sequences of the laser irradiation, the voltage on C 4 , and the plasma current I p .…”

Section: Experimental Apparatusmentioning

confidence: 99%

Effect of Time Delay on Laser-Triggered Discharge Plasma for a Beyond EUV Source

Tian

Zhao

et al. 2019

Symmetry

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We demonstrate the beyond extreme ultraviolet (BEUV) emission by a laser-triggered discharge source with the laser-current delay between 0.6 µs and 3 µs. The spectra at different electron temperatures are simulated theoretically, and the spectra at different laser-current delays are measured experimentally. The theoretical and experimental results show that the lower vapor velocity at longer laser-current delay time is beneficial for increasing the steady-state time of plasma at high temperature, thereby increasing the output intensity and spectral purity of 6.76 nm. The radiation intensity of 6.76 nm (0.6% bandwidth) increases about 240% when the delay increases from 0.6 to 3 μs.

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Section: Experimental Apparatusmentioning

confidence: 99%

Effect of Time Delay on Laser-Triggered Discharge Plasma for a Beyond EUV Source

Tian

Zhao

et al. 2019

Symmetry

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“…In this way, it can be used not only for EUVL, but also for EUV-induced plasma [8], nano-patterning [9], and X-ray microscopy [10,11]. Moreover, it can be used to inspect the key components of the EUVL system, such as the mask and so on [12].…”

Section: Introductionmentioning

confidence: 99%

Influence of Pre-Ionized Plasma on the Dynamics of a Tin Laser-Triggered Discharge-Plasma

Deng

Tian

et al. 2019

Applied Sciences

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The effect of laser-current delay on extreme ultraviolet emission by laser-triggered discharge-plasma has been investigated. Typical waveforms for current, voltage, laser signals, and X-ray signals have been compared. Theoretical tin spectra were simulated among the electron temperature ranges from 10 to 50 eV to compare with the experimental results. The results show that longer laser-current delay time is propitious to increase the steady-state time of plasma at high temperatures, and it increases the intensity and spectral purity of 13.5 nm emission in 2% band. The 13.5 nm radiation intensity increases about 120% with the delay increasing from 0.7 to 5 μs, and the extreme ultraviolet (EUV) emission conversion efficiency (CE) increases from 0.5% to 1.1%.

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“…[4][5][6] The primary strategies being pursued to increase LPP power are to increase the drive laser power (e.g., to 40 kW) or to possibly use a free-electron laser (FEL) 7 and various hybrid devices. [8][9][10][11] An alternative, simpler, and more practical approach would be to improve EUV conversion efficiency (CE) by recycling unused out-of-band (OoB) radiation back to the plasma via reflective optics. This method was first proposed by Bayraktar et al, 12 and Johnson 13,14 improved the method to greatly increase recycling efficiency and also provide spectral filtering capability.…”

Section: Introductionmentioning

confidence: 99%

Recycling of laser and plasma radiation energy for enhancement of extreme ultraviolet sources for nanolithography

Sizyuk

Hassanein

et al. 2018

Journal of Applied Physics

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We have developed comprehensive integrated models for detailed simulation of laser-produced plasma (LPP) and laser/target interaction, with potential recycling of the escaping laser and out-ofband plasma radiation. Recycling, i.e., returning the escaping laser and plasma radiation to the extreme ultraviolet (EUV) generation region using retroreflective mirrors, has the potential of increasing the EUV conversion efficiency (CE) by up to 60% according to our simulations. This would result in significantly reduced power consumption and/or increased EUV output. Based on our recently developed models, our High Energy Interaction with General Heterogeneous Target Systems (HEIGHTS) computer simulation package was upgraded for LPP devices to include various radiation recycling regimes and to estimate the potential CE enhancement. The upgraded HEIGHTS was used to study recycling of both laser and plasma-generated radiation and to predict possible gains in conversion efficiency compared to no-recycling LPP devices when using droplets of tin target. We considered three versions of the LPP system including a single CO 2 laser, a single Nd:YAG laser, and a dual-pulse device combining both laser systems. The gains in generating EUV energy were predicted and compared for these systems. Overall, laser and radiation energy recycling showed the potential for significant enhancement in source efficiency of up to 60% for the dual-pulse system. Significantly higher CE gains might be possible with optimization of the pre-pulse and main pulse parameters and source size.

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High-brightness laser-induced EUV source based on tin plasma with an unlimited lifetime of electrodes

Cited by 9 publications

References 3 publications

Effect of Time Delay on Laser-Triggered Discharge Plasma for a Beyond EUV Source

Effect of Time Delay on Laser-Triggered Discharge Plasma for a Beyond EUV Source

Influence of Pre-Ionized Plasma on the Dynamics of a Tin Laser-Triggered Discharge-Plasma

Recycling of laser and plasma radiation energy for enhancement of extreme ultraviolet sources for nanolithography

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