“…Additionally, when trying to rationalize the underlying mechanism of CL installation, diffusion limitations are expected to play a role, since diffusion pathways through the pores are successively blocked with increasing CL installation. While longer reaction times and relatively high temperatures can overcome such diffusion barriers 30,31 , vapor phase infiltration at elevated temperatures with CLs that exhibit low sublimation temperatures have proved most suitable in this context 13,30,32 . It is also interesting to note that current literature examples are limited to retrofitting with ditopic CLs 21–23,26,27,31 , with bulkier tritopic ligands further increasing concerns related to diffusion limitations.…”