Growth structure of SiOx films deposited on various substrate particles by PECVD in a circulating fluidized bed reactor

Diagnostics of SiOx‐Containing Layers Deposited on Powder Particles by Dielectric Barrier Discharge

“…However, diagnosis of film properties of the powder particles is difficult because these “micro‐substrates” may be different from films deposited onto large and flat macroscopic substrates. This problem has also been reported by other authors 37, 38…”

Surface modification of the nanoparticles by an atmospheric room-temperature plasma fluidized bed

“…5(b) were homogeneously coated by the HMDSO polymer when they passed through the ARPFB, some new NPs may not be modified entirely, and coagulated again. According to Borer and Rohr [19], the surface properties of substrate affected the deposition process greatly, and nodular defects, which were caused by the dust particles on the substrate, occurred in the thick SiO x film. Because the NiO NPs own highly smooth surfaces and high surface energy, they can be coated by the HMDSO polymer.…”

Magnetron sputter deposition onto fluidized particle beds

“…Sathiyamoorthy provides a review of plasma technology used with fluidized bed techniques [16]. Borer and von Rohr integrated a microwave plasma source into a circulating fluidized bed reactor in order to generate SiO x coatings on salt and silica gel particles [17]. Similarly, Morstein et al used microwave and radio frequency (RF) plasma coupled with a gas-fluidized bed to produce thin titania coatings on glass powders [18].…”