We report the effects of oxygen flow rate on the electrical properties of transparent silicon oxynitride (SiON)/Ag/SiON multilayer films, whose layers were formed via continuous sputtering. The SiON/Ag/SiON multilayer that was sputtered at low oxygen flow rates (below 0.6 sccm) showed metallic conduction (dρ/dT > 0) with a resistivity of 2.013 × 10 −4 Ohm-cm, while SiON/Ag/SiON film grown at high oxygen flow rates exhibited insulating behavior. These opposing electrical behaviors are related to the transition of the inserted Ag layer from a continuous layer to a layer of randomly disconnected islands with increasing oxygen flow rate.In 2 O 3 , ZnO and SnO 2 -based transparent conducting oxides (TCOs) have been widely employed as transparent electrodes in flatpanel displays, photovoltaics, and touch panels due to their low resistivities and high optical transmittances in the visible wavelength region. 1-4 Yet, recent rapid advances in transparent optoelectronics are requiring that transparent electrodes have much lower resistivities than those of conventional ITO, GZO, AZO, and FTO films. 5 In particular, the resistivities of the transparent interconnects in transparent displays should be comparable to those in metallic Cu or Al films. For these reasons, oxide-metal-oxide (OMO) multilayer electrodes with metallic conduction behaviors have been suggested as promising candidates to replace conventional ITO films due to their very low resistivities (∼10 −5 Ohm-cm) and high transmittances (85%). In our previous work, we suggested various OMO multilayer schemes, such as IZTO/Ag/IZTO, 6 ITO/Ag/ITO, 7, 8 IZO/Ag/IZO, 9 Nb:TiO 2 /Ag/Nb:TiO 2 , 10, 11 GZO/Ag/GZO, 12 AZO/Ag/AZO, 12 and ZTO/Ag/ZTO, 13 for application in organic light emitting diodes (OLEDs) and organic photovoltaics. Even with an oblique Ag layer, most OMO multilayer electrodes exhibit high transparency due to the antireflection effect of Ag-dielectric interfaces, as well as a metallic resistivity of ∼10 −5 Ohm-cm. 8, 14 Although Cattin et al. and Leng et al. reported the electrical and optical properties of insulator-Ag-insulator multilayer, 15, 16 a detailed investigation of SiON-Ag-SiON multilayer is still lacking. In particular, there is no report on how the oxygen flow rate during the sputtering process affects the electrical properties of transparent SiON/Ag/SiON films.In this study, we investigated the effects of the oxygen flow rate on the electrical properties of a SiON/Ag/SiON multilayer film during sputtering of both SiON and Ag layers. We found that the oxygen flow rate during continuous sputtering critically affects the conductivity of the SiON/Ag/SiON multilayer. Here we suggest a possible mechanism to explain the different electrical properties of the SiON/Ag/SiON multilayer based on XPS depth profile analysis and HRTEM examination.To test these properties, a SiON (35 nm)/Ag (12 nm)/SiON (35 nm) multilayer was prepared using a tilted dual-target RF magnetron sputtering system with a constant Ar flow rate of 10 sccm while the oxygen flow rate w...