2006
DOI: 10.1016/j.susc.2006.02.067
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Growth of manganese silicide films by co-deposition of Mn and Si on Si(111): A spectroscopic and morphological investigation

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Cited by 27 publications
(24 citation statements)
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“…Thus the valence band shows metallic character with peaks located at 0.2 and 1.7 eV. In agreement with several recent results [1,9,15] and theoretical calculations [16] the feature at 1.7 eV seems to be due to the hybridization of Mn 3d and Si sp states. Since this peak is present in all the samples, i.e., prior to and after the irradiation so it is understood that Mn and Si start reacting even at ambient conditions, i.e., at room temperature (RT).…”
Section: Resultssupporting
confidence: 91%
“…Thus the valence band shows metallic character with peaks located at 0.2 and 1.7 eV. In agreement with several recent results [1,9,15] and theoretical calculations [16] the feature at 1.7 eV seems to be due to the hybridization of Mn 3d and Si sp states. Since this peak is present in all the samples, i.e., prior to and after the irradiation so it is understood that Mn and Si start reacting even at ambient conditions, i.e., at room temperature (RT).…”
Section: Resultssupporting
confidence: 91%
“…1, is positioned at 46.9 eV, and cannot be described reliably by a fit procedure due to the presence of multiple overlapping peaks from the spin-orbit and multiplet splitting typical for 3d transition metals [20,[36][37][38]. The position of the main peak is commensurate with either Mn or Mn-silicides, or a mixture of both.…”
Section: Resultsmentioning
confidence: 99%
“…In order to circumvent these problems we are investigating the feasibility of a surface-driven approach for the incorporation of Mn into a Si matrix. This approach has been suggested in several theoretical studies, which indicate that selected Mn-Si surface structures, and delta-doped layers of Mn embedded in Si might indeed be ferromagnetic [11,[16][17][18][19][20][21][22][23]. A set of recent STM studies has been geared towards the investigation of the formation of Mn surface structures on the Si(1 0 0) surface [18][19][20]24].…”
Section: Introductionmentioning
confidence: 99%
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“…This conclusion led them to attempt film growth via co-deposition of Mn and Si where they found anomalously flat MnSi films. Magnano et al have also explored the co-deposition of Mn and Si to create both ultrathin magnetic films (as thin as two monolayers), and surprisingly these films displayed a hint of magnetism appearing at temperatures exceeding room [148,149]. This additional magnetic signal is thought to be due to Mn atoms with reduced coordination at surfaces or near the film-substrate interface as predicted in [145].…”
Section: Thin Films Of Monosilicides and Monogermanidesmentioning
confidence: 98%