2012
DOI: 10.1021/cm302066n
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Growth of Crystalline Copper Silicide Nanowires in High Yield within a High Boiling Point Solvent System

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Cited by 33 publications
(54 citation statements)
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“…Besides the intense peaks of the parent Cu, the diffraction patterns also show minor peaks intrinsic to the low temperature equilibrium silicide phases (Cu 15 Si 4 and Cu 0.83 Si 0.17 ), which can be assigned to the Cu x Si y network/intermediate layer. [ 11,14 ]…”
Section: Morphology Structure and Compositionmentioning
confidence: 99%
See 1 more Smart Citation
“…Besides the intense peaks of the parent Cu, the diffraction patterns also show minor peaks intrinsic to the low temperature equilibrium silicide phases (Cu 15 Si 4 and Cu 0.83 Si 0.17 ), which can be assigned to the Cu x Si y network/intermediate layer. [ 11,14 ]…”
Section: Morphology Structure and Compositionmentioning
confidence: 99%
“…[ 2,4,9,10 ] Copper (Cu) is 40 times more conductive than stainless steel (SS) with a stable potential window, and is widely accepted as a suitable CC for LIBs. However, its application for direct growth of Si NWs is hampered by the energetically favorable formation of large crystallite grains and/or nanowire based Cu‐Si compounds, [ 11,12 ] that are inactive for Li‐cycling. [ 13,14 ] The formation of micrometer‐sized crystallite grains limits the ability to directly grow robust and pure phase Si NWs on Cu substrates.…”
Section: Introductionmentioning
confidence: 99%
“…NW growth has been shown by self-induced solid phase seeding from bulk metal substrates 12,42 and also via VLS mechanism from evaporated catalytic layers that convert to discrete seeds under thermal anneal. The method allows the formation of both Si and Ge NWs using VLS (Sn 20 and In seeds 26 ) and VSS catalytic approaches (using bulk Cu 12,42 ) and has also been shown to allow seed-free Ge NW growth 41 directly from glass/Pyrex flask walls. 41,43 The use of p-block metals (e.g In and Sn) is interesting as although these have low melting points and a very low solubility for Si and Ge in the liquid eutectic, they allow for a high density of NW formation suitable for Li-ion alloying anodes.…”
Section: Physical Chemistry Chemical Physics Accepted Manuscriptmentioning
confidence: 99%
“…Traditionally in electronic circuitry, metallic silicides have been widely used for Schottky diodes, metal gates, and local interconnections in complementary metal oxide-semiconductor (CMOS) devices. [8][9][10][11] A variety of metal silicide nanowires have been achieved by either silicidation of silicon nanowires, [12][13][14] delivery of Si ux on metal lms, 7,10,11,15 reactions of metals with silicon substrates, 16,17 or co-pyrolysis of organometallic precursors of metals and silicon via chemical vapor deposition (CVD) and chemical vapor transport (CVT). [3][4][5][6][7] The major challenging issues for the controlled growth of silicide nanomaterials are their many possible phases from metal-rich to silicon-rich silicides and complex phase behaviors within a narrow composition range.…”
Section: Introductionmentioning
confidence: 99%