2013
DOI: 10.1039/c3nr03045h
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Solution-phase synthesis of single-crystal Cu3Si nanowire arrays on diverse substrates with dual functions as high-performance field emitters and efficient anti-reflective layers

Abstract: There is strong and growing interest in applying metal silicide nanowires as building blocks for a new class of silicide-based applications, including spintronics, nano-scale interconnects, thermoelectronics, and anti-reflective coating materials. Solution-phase environments provide versatile materials chemistry as well as significantly lower production costs compared to gas-phase synthesis. However, solution-phase synthesis of silicide nanowires remains challenging due to the lack of fundamental understanding… Show more

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Cited by 25 publications
(12 citation statements)
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“…The bright-field optical image in Figure 1 A and SEM panels in Figure 1 B display low- and high-magnification views, respectively, of the as-synthesized Cu 3 Si NBs. The Cu 3 Si NBs on Si(100) were aligned in two specific crystal directions along [011] and [01-1] as previously reported [ 34 , 35 ], consistent with the underlying Si atom arrangement. The Cu 3 Si NBs shown in Figure 1 are approximately 750–800 nm in diameter and 11–14 μm in length.…”
Section: Resultssupporting
confidence: 83%
See 1 more Smart Citation
“…The bright-field optical image in Figure 1 A and SEM panels in Figure 1 B display low- and high-magnification views, respectively, of the as-synthesized Cu 3 Si NBs. The Cu 3 Si NBs on Si(100) were aligned in two specific crystal directions along [011] and [01-1] as previously reported [ 34 , 35 ], consistent with the underlying Si atom arrangement. The Cu 3 Si NBs shown in Figure 1 are approximately 750–800 nm in diameter and 11–14 μm in length.…”
Section: Resultssupporting
confidence: 83%
“…The bottommost diffraction panel in Figure 3 A is from Cu 3 Si NBs self-assembled along the two preferential growth directions on Si(100). The peak appearing at 45.5° is indicative of Cu 3 Si (120)/(210) and the other peaks present are from Si [ 34 , 35 ].…”
Section: Resultsmentioning
confidence: 99%
“…Silicon and germanium nanowires (NW) are an important material set that have found significant application in photovoltaic, semiconductor, battery and biomedical devices. [1][2][3][4][5][6][7][8] The most common growth protocol for Si and Ge NWs is by vapourliquid-solid (VLS), [9][10][11][12] or vapour-solid-solid (VSS) [13][14][15][16] mechanisms achieved using chemical vapour deposition (CVD), [17][18][19] molecular beam epitaxy (MBE) 20 or laser ablation. 21 More recently, solution based methods where NWs are nucleated and grown in supercritical fluids (SCF) 22,23 or high boiling point solvents (HBS) have proved attractive for high density growth directly from substrates [24][25][26][27][28][29][30] The HBS and SCF methods also take advantage of the solvents as the carrier media for organometallic precursors in liquid form negating the requirement for silane or germane gases that are highly reactive.…”
Section: Introductionmentioning
confidence: 99%
“…CdSe QD reactions were carried out in a 10 mL stainless steel reactor similar to the apparatus used in previous reports. 40,41 The inlet of a stainless steel (1/16 00 i.d.) tube was connected to an injector valve (Valco) coupled with a 0.5 mL injection loop.…”
Section: Synthesis Of Cdse Qds By Supercritical Equipmentmentioning
confidence: 99%