2006
DOI: 10.1016/j.jcrysgro.2006.10.105
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Growth and characterization of CuFeS2 thin films

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Cited by 48 publications
(36 citation statements)
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“…The grain sizes of annealed films are enhanced with increasing Cu concentration (x) which is possibly due to the facilitation of Cu on grain growth [27]. The thicknesses of synthesized films were measured to be in the range of 1.3-2 mm which is similar to earlier reports [17,28,31].…”
Section: Composition and Surface Morphologysupporting
confidence: 84%
See 1 more Smart Citation
“…The grain sizes of annealed films are enhanced with increasing Cu concentration (x) which is possibly due to the facilitation of Cu on grain growth [27]. The thicknesses of synthesized films were measured to be in the range of 1.3-2 mm which is similar to earlier reports [17,28,31].…”
Section: Composition and Surface Morphologysupporting
confidence: 84%
“…Sato et al have examined optical, electrical and magnetic properties of chalcopyrite CuFeS 2 [15,16]. The chalcopyrite CuFeS 2 also has been synthesized to investigate its possible applications in photovoltaics, thermoelectric and spintronic devices [17][18][19][20][21][22]. Oliveira et al [23] investigated the reconstruction of the chalcopyrite surfaces by DFT calculations.…”
Section: Introductionmentioning
confidence: 99%
“…Topography was measured by using an atomic force microscopy (Quesant Instrument Corporation, Q-Scope 250) operating in contact mode, with Si 3 N 4 cantilever. Photoelectrochemical (PEC) experiments were performed using a [Fe(CN) 6 ] 3-/[Fe(CN) 6 ] 4-redox system, by performing linear sweep voltammetry between -500 to -1000 mV. The sequence of constant illumination and dark period were performed on the PEC cell to study the effect on photoactivity behavior.…”
Section: Methodsmentioning
confidence: 99%
“…There are many techniques for preparing thin films such as plasma-enhanced chemical vapor deposition, 1 metal organic chemical vapor deposition, 2 thermal evaporation, 3 chemical bath deposition, 4 close spaced sublimation, 5 vacuum evaporation, 6 electrodeposition, 7 molecular beam epitaxy, 8 spray pyrolysis 9 and sputter deposition 10 . Amongst these deposition techniques, chemical bath deposition is most commonly used because it is a simple, cost effective and convenient for larger area deposition of thin films.…”
Section: Introductionmentioning
confidence: 99%
“…There are many techniques for preparing thin films such as plasma-enhanced chemical vapor deposition, 1 metal organic chemical vapor deposition, 2 thermal evaporation, 3 chemical bath deposition, 4 close spaced sublimation, 5 vacuum evaporation, 6 electrodeposition, 7 molecular beam epitaxy, 8 spray pyrolysis 9 and sputter deposition 10 . Amongst these deposition techniques, chemical bath deposition is most commonly used because it is a simple, cost effective and convenient for larger area deposition of thin films.…”
Section: Introductionmentioning
confidence: 99%