2017
DOI: 10.1021/acsnano.7b00923
|View full text |Cite
|
Sign up to set email alerts
|

Graphene Strained by Defects

Abstract: Using graphene nanomechanical resonators we demonstrate the extent to which the mechanical properties of multilayer graphene films are controllable, in real time, through introduction and rearrangement of defects. We show both static and re-entrant (cyclical) changes in the tensile stress using a combination of ion implantation, chemical functionalization, and thermal treatment. While the dramatic increase in static tensile stress achievable through laser annealing can be of importance for various MEMS applica… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

1
22
0

Year Published

2017
2017
2022
2022

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 26 publications
(25 citation statements)
references
References 32 publications
1
22
0
Order By: Relevance
“…Here we show methods to fabricate nanostructures and access buried interfaces with the precision of a single atomic layer by using graphene as impermeable etch masks and etch stops 16 , 17 . These techniques, which we call GES (graphene etch stops), represent a straightforward method to selectively expose and contact embedded graphene layers within 2D heterostructures.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Here we show methods to fabricate nanostructures and access buried interfaces with the precision of a single atomic layer by using graphene as impermeable etch masks and etch stops 16 , 17 . These techniques, which we call GES (graphene etch stops), represent a straightforward method to selectively expose and contact embedded graphene layers within 2D heterostructures.…”
Section: Introductionmentioning
confidence: 99%
“…In contrast, graphene reacts with XeF 2 to form fluorographene (FG) 21 24 , a wide band-gap semiconducting monolayer 21 , 22 with composition C 4 F, in the case that only one side is exposed 22 . There have been several demonstrations that take advantage of this selectivity to use graphene as an etch mask for shaping MoS 2 16 , as a mask to etch underlying silicon 25 – 27 , and to create a sacrificial release layer to suspend graphene membranes on silicon on insulator 17 , 22 . Our innovation has been to apply this etch selectivity to access buried graphene layers embedded within the heterostructures and as masks for patterning the underlying layers.…”
Section: Introductionmentioning
confidence: 99%
“…In the horizontal axis, 0 eV indicates the fermi level energy. (a) Graphenylene based nanotube with chiral indexes (8,2) with no strain (e = 0%). It is important to note that the green curve (2s orbitals contribution) is close to zero, and practically coincides with the horizontal axis in black and cannot be seen clearly.…”
Section: Discussionmentioning
confidence: 99%
“…Fig. 10(a) shows our results for PG based nanotubes where one can see that, starting with e ¼ 0, higher strain values correspond to smaller gap values with a monotonic decrease for (6, 0) and (8,2) tubes. On the other hand, the (4, 4) tube presents a minimum at e $ 0:1 and the gap opening increases again for higher deformations, although the values still smaller than 3.2 eV up to the maximum strain considered.…”
Section: Electronic Structurementioning
confidence: 91%
See 1 more Smart Citation