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Sonnenfeld, Axel; Tun, T. M.; Zajı́čková, Lenka; Kozlov, K. V.; Wagner, H. Gg.; Behnke, J. F.; Hippler, R.

doi:10.1023/a:1014414016164

Cited by 127 publications

(113 citation statements)

References 16 publications

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“…The surface treatment of dielectric as well as of conducting materials is possible. Recent activities focus on the deposition of thin films-a field traditionally dominated by low pressure plasma processing [9][10][11][12][13].…”

Section: Introductionmentioning

confidence: 99%

The barrier discharge: basic properties and applications to surface treatment

Wagner

Brandenburg

Kozlov

et al. 2003

Vacuum

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667

474

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Barrier discharges (BDs) produce highly non-equilibrium plasmas in a controllable way at atmospheric pressure, and at moderate gas temperature. They provide the effective generation of atoms, radicals and excited species by energetic electrons. In the case of operation in noble gases (or noble gas/halogen gas mixtures), they are sources of an intensive UV and VUV excimer radiation. There are two different modes of BDs. Generally they are operated in the filamentary one. Under special conditions, a diffuse mode can be generated. Their physical properties are discussed, and the main electric parameters, necessary for the controlled BD operation, are listed. Recent results on spatially and temporally resolved spectroscopic investigations by cross-correlation technique are presented. BDs are applied for a long time in the wide field of plasma treatment and layer deposition. An overview on these applications is given. Selected representative examples are outlined in more detail. In particular, the surface treatment by filamentary and diffuse BDs, and the VUV catalyzed deposition of metallic layers are discussed. BDs have a great flexibility with respect to their geometrical shape, working gas mixture and operation parameters. Generally, the scaling-up to large dimensions is of no problem. The possibility to treat or coat surfaces at low gas temperature and pressures close to atmospheric once is an important advantage for their application.

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Section: Introductionmentioning

confidence: 99%

The barrier discharge: basic properties and applications to surface treatment

Wagner

Brandenburg

Kozlov

et al. 2003

Vacuum

Self Cite

667

474

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“…HMDSO is already widely used for SiO x thin film deposition in different discharge types [11,12,13,14]. In a previous study it was possible to deposit thin films from HMDSO in nitrogen APTD [15].…”

Section: Introductionmentioning

confidence: 99%

Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge

Trunec¹,

Zajı́čková²,

Buršı́ková³

et al. 2010

J. Phys. D: Appl. Phys.

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To cite this version:DAbstract. The atmospheric pressure dielectric barrier discharge burning in nitrogen with small admixture of hexamethyldisiloxane (HMDSO) was used for the deposition of thin organosilicon films. The thin films were deposited on glass, silicon and polycarbonate substrates, the substrate temperature during the deposition process was elevated up to values within the range 25 • C -150 • C in order to obtain hard SiO x -like thin films. The properties of the discharge were studied by means of optical emission spectroscopy and electrical measurements. The deposited films were characterised by Rutherford backscattering and elastic recoil detection methods, x-ray photoelectron spectroscopy, infrared spectroscopy measurements, ellipsometry and depth sensing indentation technique. It was found that the films properties depend significantly on substrate temperature at deposition. An increase of substrate temperature from 25 • C to 150 • C leads to an increase of film hardness from 0.4 GPa to 7 GPa and the film chemical composition changes from CH x Si y O z to SiO x H y . The films were transparent in visible range.

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“…[4] Within the last years, deposition of plasma polymerised films by these sources has been studied as well. [5][6][7][8] However, due to complex 3D-geometries of aircraft structures, atmospheric plasma jet sources need to be employed, where the plasma source can be mounted on a robot. Different jet sources have been investigated for the deposition of silicon-based coatings such as an RF driven jet source [9] or a DC Arc Jet, [10] as well as a commercially available open air plasma jet (PlasmaTreat, Pt), which has already been used for the deposition of corrosion protective films on Al alloys [11,12] and is also known from adhesive bonding in automotive The paper presents investigations on the deposition of plasma polymerised films at atmospheric pressure as a pretreatment for painting and adhesive bonding of aircraft aluminium structures.…”

Section: Introductionmentioning

confidence: 99%

Atmospheric Pressure Plasma Deposition of Adhesion Promotion Layers on Aluminium

Bringmann¹,

Rohr²,

Gammel³

et al. 2009

Plasma Processes & Polymers

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The paper presents investigations on the deposition of plasma polymerised films at atmospheric pressure as a pretreatment for painting and adhesive bonding of aircraft aluminium structures. Two different plasma jet sources are employed, one based on a controlled arc discharge and air as process gas, and another based on a dielectric barrier discharge (DBD) and He as plasma gas. The organosilicon precursors HMDSO, TEOS and OMCTS are used with both plasma sources. Deposition in the arc discharge plasma jet leads to almost carbon‐free silica coatings, whereas coatings deposited with the DBD jet source contain a high amount of carbon, varying with precursor type. The obtained results of corrosion investigations and adhesion tests are promising, as some representative aircraft industry requirements could be achieved. However, the investigations show a strong dependency on the used precursor and type of polymer (paint or adhesive) applied on the plasma polymerised film.

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Untitled

Cited by 127 publications

References 16 publications

The barrier discharge: basic properties and applications to surface treatment

The barrier discharge: basic properties and applications to surface treatment

Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge

Atmospheric Pressure Plasma Deposition of Adhesion Promotion Layers on Aluminium

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