2001
DOI: 10.1364/josab.18.001041
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Generation and application of a high-average-power polarized soft-x-ray laser beam

Abstract: We demonstrate the generation of a highly polarized soft-x-ray beam with a compact high-repetition-rate tabletop soft-x-ray laser. The radiation emitted by a high-average-power discharge-pumped tabletop Ne-like Ar soft-x-ray laser operating at 46.9 nm was polarized with a pair of Si/Sc multilayer mirrors designed for 45°o peration. A degree of polarization greater than 0.96 was obtained. The polarized beam was used to characterize the efficiency of a diffraction grating. Intense polarized soft-x-ray radiation … Show more

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Cited by 9 publications
(3 citation statements)
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“…They obtained a minimum value of k of $0.03 at 26.9 eV, a photon energy close to the Ne-like Ar line laser operating at 26.4 eV. 21 These reported low-absorption values were a motivation for this research, since, if verified, they could render SrF 2 a promising material for multilayer coatings operating near 26.9 eV. Nevertheless, a much larger k value of 0.45 for SrF 2 films was measured at 26.9 eV in the present research.…”
Section: A Transmittance and Extinction Coefficient Of Srfmentioning
confidence: 87%
“…They obtained a minimum value of k of $0.03 at 26.9 eV, a photon energy close to the Ne-like Ar line laser operating at 26.4 eV. 21 These reported low-absorption values were a motivation for this research, since, if verified, they could render SrF 2 a promising material for multilayer coatings operating near 26.9 eV. Nevertheless, a much larger k value of 0.45 for SrF 2 films was measured at 26.9 eV in the present research.…”
Section: A Transmittance and Extinction Coefficient Of Srfmentioning
confidence: 87%
“…Multilayer (ML) based interference reflective optics working at near-normal incidence in the 35–50 nm spectral range has impetuously progressed in the past two decades, which advances applications of discharge X-ray or EUV lasers, X-ray astronomy, soft X-ray microscopy, and high order harmonic generation (HHG) instrumentations, where MLs with high reflectivity and thermal stability are required. However, the use of multilayer structure is restricted by low reflectivity because all of the materials show a strong absorption in the 35–50 nm spectral range.…”
Section: Introductionmentioning
confidence: 99%
“…Scandium-silicon (Sc/Si) multilayers were shown to be effective in the wavelength range of 38-50 nm with reflectivities of 30-50% at normal incidence [13]. They demonstrated their feasibility in laser interferometry [14], polarimetry [15], ellipsometry [16], spectroscopy [17] and microscopy with nano-scale resolution [18]. Sc/Si MXMs could focus laser energy (λ = 46.9 nm) to the intensity of up to ∼10 11 W/cm 2 that is in excess of the ablation threshold for metallic materials [19].…”
Section: Introductionmentioning
confidence: 99%