2019 IEEE 46th Photovoltaic Specialists Conference (PVSC) 2019
DOI: 10.1109/pvsc40753.2019.8980914
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Ge virtual substrates for high efficiency III-V solar cells: applications, potential and challenges

Abstract: Virtual substrates based on thin Ge layers on Si by direct deposition have achieved high quality recently. Their application to high efficiency III-V solar cells is analyzed in this work. Replacing traditional Ge substrates with Ge/Si virtual substrates in standard lattice-matched and upright metamorphic GaInP/Ga(In)As/Ge solar cells is feasible according to our calculations using realistic parameters of state-of-the-art Ge solar cells but with thin bases (< 5µm). The first experimental steps are tackled by im… Show more

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Cited by 7 publications
(22 citation statements)
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“…The purpose of these preliminary experiments was to implement the first prototype solar cells and gauge the potential to achieve high efficiencies. No issue was found when growing III-V structures on these Ge/Si virtual substrates, which behave similarly as standard Ge substrates, as long as surface readiness for epitaxy and first nucleation steps are concerned, as observed during in-situ spectrometry measurements (details in [7]).…”
Section: Resultsmentioning
confidence: 95%
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“…The purpose of these preliminary experiments was to implement the first prototype solar cells and gauge the potential to achieve high efficiencies. No issue was found when growing III-V structures on these Ge/Si virtual substrates, which behave similarly as standard Ge substrates, as long as surface readiness for epitaxy and first nucleation steps are concerned, as observed during in-situ spectrometry measurements (details in [7]).…”
Section: Resultsmentioning
confidence: 95%
“…The details about the methods used for the theoretical and experimental work presented in this work can be found in our previous work on this topic [7]. Briefly, the modelling work was carried out using a numerical approach by means of the TCAD tool Silvaco Atlas.…”
Section: Methodsmentioning
confidence: 99%
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