2019 European Space Power Conference (ESPC) 2019
DOI: 10.1109/espc.2019.8932026
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Space III-V Multijunction Solar Cells on Ge/Si virtual substrates

Abstract: Virtual substrates based on thin Ge layers on Si substrates by direct deposition have recently achieved high quality. In this work, their application as low cost, removable substrates for the growth of high efficiency, lightweight and flexible multijunction solar cells for space applications is analyzed. Experimental Ge single-junction solar cells and GaInP/Ga(In)As/Ge triple-junction solar cells using the Ge/Si virtual substrate as an active bottom junction (being the Si inactive), are implemented using mediu… Show more

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Cited by 6 publications
(6 citation statements)
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“…Figure 8 shows the EQE of the top and middle cells in the 3JSC, compared to the case of a typical design on standard Ge substrates. The Ge bottom cell is not shown because it was not possible to measure it due to its leaky behaviour similarly as already reported for Ge|Si substrates with 5 µm Ge layer [19], [20]. As compared to the standard design, the GaInP top cell shows the expected shift in absorption edge in both the absorber material and window layer as a result of the higher In content.…”
Section: Gainp/gainas/ge|si Triple-junction Solar Cell Resultsmentioning
confidence: 82%
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“…Figure 8 shows the EQE of the top and middle cells in the 3JSC, compared to the case of a typical design on standard Ge substrates. The Ge bottom cell is not shown because it was not possible to measure it due to its leaky behaviour similarly as already reported for Ge|Si substrates with 5 µm Ge layer [19], [20]. As compared to the standard design, the GaInP top cell shows the expected shift in absorption edge in both the absorber material and window layer as a result of the higher In content.…”
Section: Gainp/gainas/ge|si Triple-junction Solar Cell Resultsmentioning
confidence: 82%
“…The Ge layers were deposited by CVD as explained elsewhere [19]. In this work, virtual substrates with a 3 µm thick Ge layer are used, as compared to our previous reports for 5 µm thick Ge layers [19], [20]. These thinner Ge subcells were experimentally confirmed to achieve the required J sc for the 3JSC application.…”
Section: Methodsmentioning
confidence: 99%
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“…Purification purpose added alum and chlorine at the end of purifier cycles and obtained pure water which is useful [16], [17]. The gallium layer is used on silicon for the direct deposition to get the highquality solar cells, application low in cost, high efficiency, low weight, and flexible III-V multijunction solar cells produced [18]. Various metamorphic tunnel junction designs, to target maximum application, of single-junction, double junction solar photovoltaic cells, grown via both molecular beam epitaxy (MBE); and metal-organic chemical vapor deposition (MOCVD), have been demonstrated.…”
Section: Introductionmentioning
confidence: 99%