“…Recently, we have shown that aerosol-assisted chemical vapor deposition (AACVD) is a suitable method for growing, in a single step, WO 3 nanoneedles decorated with metal nanoparticles. ,,, Unlike in conventional CVD, where precursors must be volatile and thermally stable, AACVD allows for the use of a wide range of precursors owing to its solution-delivery-based principle . Furthermore, the AACVD process is conducted at lower temperatures than CVD, typically in a range between 350 and 600 °C, which makes it suitable for the direct, bottom-up integration of gas-sensitive nanomaterials onto a wide spectrum of substrates including glass, ceramic, silicon micro/electromechanical systems (MEMSs), or even flexible polymeric . In this paper, we report, for the first time, on the direct growth of WO 3 nanoneedles decorated with p-type Cu 2 O nanoparticles onto MEMS hot plates in a single step by using AACVD.…”