2016 IEEE Student Conference on Research and Development (SCOReD) 2016
DOI: 10.1109/scored.2016.7810094
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Gain Investigation for commercial GaAs and SiGe HBT LNA's under Electron irradiation

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Cited by 9 publications
(5 citation statements)
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“…Finally, the recorded increase in collector current, despite constant base bias current, may be attributed to various effects. It may be attributed to increased effective base current as a result of trapped charges between the emitter-base junction [8] [13]. The sudden increase (as observed in Fig 12) under moderate damage, however, is contrary to the gradual degradation observed in other performance parameters.…”
Section: Resultsmentioning
confidence: 86%
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“…Finally, the recorded increase in collector current, despite constant base bias current, may be attributed to various effects. It may be attributed to increased effective base current as a result of trapped charges between the emitter-base junction [8] [13]. The sudden increase (as observed in Fig 12) under moderate damage, however, is contrary to the gradual degradation observed in other performance parameters.…”
Section: Resultsmentioning
confidence: 86%
“…The data would indicate very limited open sources data in electron radiation effect on mm-wave LNAs. In [13], where electron irradiation is investigated, NF degradation data is not provided, nor is the FoM. It is, however, interesting to note the severe gain degradation observed under electron radiation > 10 Mrad(Si), both in this work and in [13], while SiGe's resilience to irradiation in [19] is only discussed in terms of gamma, neutron and proton radiation.…”
Section: Resultsmentioning
confidence: 92%
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“…The forward current gain ( / I I C B ) of the designed device obtained is about 500. The gain is higher than that previously reported [1,[39][40][41]. The device with high gain is of interest for ensuring the effective operation of the SiGe HBT within an amplification circuit [42][43][44].…”
Section: Sige Hbt Structure and Physical Modelsmentioning
confidence: 77%
“…To address the challenges and explore the capability of the 23-GHz solution, this work presents a high-efficiency and low-NF TX/LNA FEM, implemented in a 130-nm SiGe BiCMOS process for its high gain and built-in radiation resistivity [16], [17], [18]. The proposed TX/LNA FEM is designed to be compact in order to minimize the overall cost.…”
Section: Circuit-level Solutionsmentioning
confidence: 99%