1997
DOI: 10.1142/9789812384690
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Fundamentals of Semiconductor Physics and Devices

Abstract: FUNDAMENTALS OF SEMICONDIJC'IOK PHYSICS AND DEVICES

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Cited by 66 publications
(77 citation statements)
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“…Bulk AlAs, bulk GaAs and AlAs / GaAs interfaces were all grown epitaxially on the same GaAs wafer along the [001] crystal direction by MBE [1][2][3]. The substrate was polished to a tolerance of ±0.…”
Section: Sample Preparationmentioning
confidence: 99%
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“…Bulk AlAs, bulk GaAs and AlAs / GaAs interfaces were all grown epitaxially on the same GaAs wafer along the [001] crystal direction by MBE [1][2][3]. The substrate was polished to a tolerance of ±0.…”
Section: Sample Preparationmentioning
confidence: 99%
“…The sharpness of semiconductor layers is an active area of interest as the quality of such structures has a direct influence on the electronic and optical properties of the latest highspeed semiconductor devices [1][2][3][4]. In this context, interfacial sharpness is considered a general term for the level of deviation from a perfect interface that gives rise to a compositional transition region between two materials.…”
Section: Introductionmentioning
confidence: 99%
“…Usually these mobilities are calculated within the EMA. [12][13][14] This approximation is however not anymore valid for a superlattice with extremely small layer thicknesses w Si and w SiO 2 . The confinement leads to many electron and hole subbands, which are all involved in the transport processes.…”
Section: ͑2͒mentioning
confidence: 99%
“…They correspond to quantities averaged also over all directions. In the bulk case with an isotropic electron ͑hole͒ effective mass m n ͑m p ͒ expression ͑3͒ yields, 13,14 N C = 1…”
Section: ͑2͒mentioning
confidence: 99%
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