2012
DOI: 10.1016/j.ultramic.2011.10.015
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Experimental evaluation of interfaces using atomic-resolution high angle annular dark field (HAADF) imaging

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Cited by 16 publications
(5 citation statements)
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“…24) Further careful processing of HAADF-STEM images will statistically quantify the transition region thickness and enable us to examine interface abruptness more rigorously. 25) A more quantitative analysis of the HAADF-STEM image of AlAs/ InGaAs/InAs DB structures will be described elsewhere.…”
Section: Resultsmentioning
confidence: 99%
“…24) Further careful processing of HAADF-STEM images will statistically quantify the transition region thickness and enable us to examine interface abruptness more rigorously. 25) A more quantitative analysis of the HAADF-STEM image of AlAs/ InGaAs/InAs DB structures will be described elsewhere.…”
Section: Resultsmentioning
confidence: 99%
“…Most nanorods do not persist through the entire thickness as is discussed further in the Supporting Information with the aid of image simulations. In addition, the electron beam tends to spread significantly after channelling along a heavy column for a few unit cells resulting in significant background signals in both imaging and spectroscopy 15. Thus, each atomic column in the spectrum image will also contain unknown contributions from the BiFeO 3 matrix and the chemistry cannot be absolutely quantified from the EELS‐SI.…”
Section: Resultsmentioning
confidence: 99%
“…Compound semiconductors of III–V type, in particular composition variations and interface properties, are investigated in Refs. . The possibilities of HAADF‐STEM considerably increased with the availability of spherical aberration‐corrected electron microscopes.…”
Section: Methodsmentioning
confidence: 99%