2000
DOI: 10.1021/ja993024i
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Functionalization of Diamond(100) by Diels−Alder Chemistry

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Cited by 91 publications
(93 citation statements)
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References 29 publications
(19 reference statements)
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“…The authors outline several possibilities based on mechanisms proposed for thermal reactions of similar species at diamond [68,69,70] and silicon [71,72] surfaces, and the earlier work of Mazur and Murray, who proposed that surface carbon radicals form when carbon substrates are heated under vacuum or are abraded in the absence of air [29,30]. Figures 7-9 depict possible reaction pathways.…”
Section: Grafting Using Alkenes and Alkynesmentioning
confidence: 99%
“…The authors outline several possibilities based on mechanisms proposed for thermal reactions of similar species at diamond [68,69,70] and silicon [71,72] surfaces, and the earlier work of Mazur and Murray, who proposed that surface carbon radicals form when carbon substrates are heated under vacuum or are abraded in the absence of air [29,30]. Figures 7-9 depict possible reaction pathways.…”
Section: Grafting Using Alkenes and Alkynesmentioning
confidence: 99%
“…We start our discussion of the slab model used in this calculation by first considering the relaxed (100) surface of diamond, which contains unsaturated dimers with significant carboncarbon double bond character that has been successfully functionalized with a Diels-Adler reaction [24]. The C(100) surface is one of the high surface energy facets and is one of the growth faces of DLC surface films.…”
Section: C(100)2x1-h Model and Computational Methodsmentioning
confidence: 99%
“…In fact, [4+2] cycloaddition reaction occurs on the clean diamond (100)-2 × 1 surface, where the surface dimer acts as a dienophile. The surface product was found to be stable up to approximately 1,000 K [59,60]. 1,3-Butadiene attains high coverage as well as forms a thermally stable adlayer on reconstructed diamond (100)-2 × 1 surface due to its ability to undergo [4+2] cycloaddition [61].…”
Section: [4+2] Cycloadditions On Surfacementioning
confidence: 99%