Abstract:A complex optimization is required to reach the full poten tial of the selective emitter (SE) architecture. The focus of this report will be the front metal contact and phosphorous emitter diffusion strength. This optimization requires con sideration of Rsheet (sheet resistance) of the field and con tact regions as a function of diffusion recipe, metal Rcontact (contact resistance) as a function metal paste, and Remitter (emitter resistance) as a function of finger spacing. To cover the Rsheet , field range of… Show more
“…A final conductor line width reduction of approximately 10 μm is measured. According to previous calculations, a 10 μm line width reduction is expected to give a 0.3 mA / cm 2 increase in Jsc [3]. No additional fingers were added to the design, so this reduced width enabled a laydown reduction of 10 -20 mg.…”
“…A final conductor line width reduction of approximately 10 μm is measured. According to previous calculations, a 10 μm line width reduction is expected to give a 0.3 mA / cm 2 increase in Jsc [3]. No additional fingers were added to the design, so this reduced width enabled a laydown reduction of 10 -20 mg.…”
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