2006
DOI: 10.1016/j.mee.2006.01.065
|View full text |Cite
|
Sign up to set email alerts
|

Free-standing macroporous silicon membranes over a large cavity for filtering and lab-on-chip applications

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
9
0

Year Published

2007
2007
2017
2017

Publication Types

Select...
5
3

Relationship

1
7

Authors

Journals

citations
Cited by 21 publications
(9 citation statements)
references
References 19 publications
0
9
0
Order By: Relevance
“…82 Considering the formation of pSi layer with a certain thickness, this layer is released by sharply increasing current density to silicon electropolishing mode (B500 mA cm À2 for p-type silicon). [190][191][192][193][194][195][196][197] A major disadvantage of the method is that the layer is easily broken into small pieces after detaching from substrates. A refined method for the detachment is examined by reducing the HF concentration at the end of the anodic process.…”
Section: Free-standing and Flow-throughmentioning
confidence: 99%
“…82 Considering the formation of pSi layer with a certain thickness, this layer is released by sharply increasing current density to silicon electropolishing mode (B500 mA cm À2 for p-type silicon). [190][191][192][193][194][195][196][197] A major disadvantage of the method is that the layer is easily broken into small pieces after detaching from substrates. A refined method for the detachment is examined by reducing the HF concentration at the end of the anodic process.…”
Section: Free-standing and Flow-throughmentioning
confidence: 99%
“…It was observed that the current density has less effect on the pore diameter. From previous studies, the pore size diameter was affected more by the HF concentration [14] and doping level [22,23].…”
Section: Resultsmentioning
confidence: 99%
“…This can be done with a sufficiently diluted etchant or with plasma. Alternatively, one can oxidize the PS and then remove the oxide by an HF dip [50,54]. This method can be also applied to MPS structures by a double-layer technique: first etching the macroporous volume and afterwards evolving the micro-PS beneath the macropores [54].…”
Section: In Situmentioning
confidence: 99%
“…However, it is in microfluidics and lab-on-chip applications that MPS is most interesting. Pore diameter can be modulated and adjusted for filtering applications [46,54], such that using the appropriate pore size one can selectively allow the passage of particles or biological species. Furthermore, the device can easily be protected against harsh environments by oxidation or other surface treatment.…”
Section: Other Mems Devicesmentioning
confidence: 99%