Abstract:Fluorocarbon species (CxFy) are commonly used in plasma etch processes. Trifluoroiodomethane (CF3I) might also be used as an etch gas, but there is a limited understanding as to how it will react. In this article, the authors examine the creation of CxFy daughter species from CF3I under different plasma conditions. Here, Fourier transform infrared spectroscopy (FTIR) was used to measure the concentration of various gas species. Readings were taken at different plasma powers and different chamber pressures. Out… Show more
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