2008
DOI: 10.1016/j.jcrysgro.2007.11.172
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Formation of Zn-doped CuInSe2 films by thermal annealing using dimethylzinc

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Cited by 15 publications
(10 citation statements)
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References 19 publications
(24 reference statements)
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“…The values of the diffusion depth estimated from both depth profiles using glow discharge optical emission spectroscopy and capacitance-voltage measurements are approximately the same as the estimated values [9]. Details of the experimental results have been provided in our previous report [16]. The Zn diffusion depth was controlled by varying the DMZn gas flow time to form an electrical pn-interface in the CIS films.…”
supporting
confidence: 65%
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“…The values of the diffusion depth estimated from both depth profiles using glow discharge optical emission spectroscopy and capacitance-voltage measurements are approximately the same as the estimated values [9]. Details of the experimental results have been provided in our previous report [16]. The Zn diffusion depth was controlled by varying the DMZn gas flow time to form an electrical pn-interface in the CIS films.…”
supporting
confidence: 65%
“…Although the present CIS and CIGS films are of insufficient quality for use in the absorption layer, a simplest solar cell structure was fabricated to elucidate the effect of the Zn-diffusion layer using DMZn for the CIGS solar cell. The surface region of Zn-diffused CIS films typically exhibited n-type conductivity in the hot-point probe analysis and the I-V characteristics of a Zn-diffused CIS/Mo/SLG structure revealed rectifying properties [16]. These results implied the formation of a CIS pnhomojunction.…”
mentioning
confidence: 89%
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“…Xianzhong Sun et al have grown ZnIn 2 Se 4 buffer layer by thermal diffusion on CuInSe 2 thin film deposited by electrodeposition [9]. ZnIn 2 Se 4 material has also been prepared by co-evaporation [10][11][12], chemical vapor deposition [13], spray pyrolysis [14,15], and vertical Bridgman technique [16]. However, no attempt has been made for deposition of ZnIn 2 Se 4 thin films by electrodeposition method.…”
Section: Introductionmentioning
confidence: 99%