Formation of titanium silicides by titanium deposition onto silicon with simultaneous self-ion bombardment

Gusev, I.V.; Chapljuk, V.I.; Belevsky, V.P.

doi:10.1016/0040-6090(95)08152-6

Cited by 3 publications

(1 citation statement)

References 4 publications

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“…In thermodynamics, the bond energy and bond dissociation energy of Ni-Si 11 are both higher than Ni-Ni, which indicates that it requires higher energy to break the NiSi bonds to form new chemical bonds than to break Ni-Ni. Costly physical vapor deposition (PVD) methods are commonly used to synthesize metal silicides [12][13][14] . Considering the cost in large-scale manufacturing, in this experiment, we have successfully developed a vacuum-free chemical-solution method to grow nickel silicides upon the surfaces of Ni nanochains.…”

Section: Introductionmentioning

confidence: 99%

Anti-oxidation high-performance solution-processed Ni plasmonic nanochain-SiO_xselective solar thermal absorbers

Wang

Zhang

et al. 2014

SPIE Proceedings

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In order to address the metal oxidation issue in cermet solar thermal absorbers at high working temperatures, we developed solution-processed plasmonic Ni nanochain-SiOx (x≤2) selective solar thermal absorbers that exhibit high solar absorption, low thermal emittance, and strong anti-oxidation behavior up to 600 ºC in air. The thermal stability is far superior to more conventional Ni nanoparticle-Al2O3 selective solar thermal absorbers, which readily oxidize at 450 ºC. Ni nanochains were embedded in SiOx and SiO2 matrices which are derived from hydrogen silsesquioxane (HSQ) and tetraethyl orthosilicate (TEOS) precursors, respectively. Fourier transform infrared spectroscopy (FTIR) shows that the dissociation of Si-O cage-like structures into Si-O networks helped to retard the oxidation process of Ni, possibly by facilitating the formation of chemical bonding between Si in the matrix and the Ni nanochains. X-ray photoelectron spectroscopy (XPS) further shows that the excess Si from the dissociation of HSQ formed silicide-like chemical bonds with Ni that are robust to high temperature oxidation and protect the Ni nanostructures. Besides, the Ni-SiOx system showed 90% solar absorptance and a low thermal emissivity of 20% at 300 ºC in air, compared to ~30% emittance of conventional coating at the same temperature. This technology helps to eliminate the problem of vacuum breaching and further reduces the fabrication cost of the solar selective coating. With a high solar absorptance, a low thermal emittance in the infrared region, and excellent anti-oxidation property, this type of selective solar thermal absorber is promising for applications in future generations of CSP systems.

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Section: Introductionmentioning

confidence: 99%

Anti-oxidation high-performance solution-processed Ni plasmonic nanochain-SiO_xselective solar thermal absorbers

Wang

Zhang

et al. 2014

SPIE Proceedings

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Radiation damage of Si wafers modified by means of thin layer ion assisted deposition

Ташлыков

Бобрович

2005

Vacuum

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Method and experimental arrangement for Al thin film deposition from r.f. metal plasma with simultaneous self-ion bombardment

Gusev¹,

Belevsky²

2000

Nuclear Instruments and Methods in Physics Research Section B:

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Formation of titanium silicides by titanium deposition onto silicon with simultaneous self-ion bombardment

Cited by 3 publications

References 4 publications

Anti-oxidation high-performance solution-processed Ni plasmonic nanochain-SiO_xselective solar thermal absorbers

Anti-oxidation high-performance solution-processed Ni plasmonic nanochain-SiO_xselective solar thermal absorbers

Radiation damage of Si wafers modified by means of thin layer ion assisted deposition

Method and experimental arrangement for Al thin film deposition from r.f. metal plasma with simultaneous self-ion bombardment

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Formation of titanium silicides by titanium deposition onto silicon with simultaneous self-ion bombardment

Cited by 3 publications

References 4 publications

Anti-oxidation high-performance solution-processed Ni plasmonic nanochain-SiOxselective solar thermal absorbers

Anti-oxidation high-performance solution-processed Ni plasmonic nanochain-SiOxselective solar thermal absorbers

Radiation damage of Si wafers modified by means of thin layer ion assisted deposition

Method and experimental arrangement for Al thin film deposition from r.f. metal plasma with simultaneous self-ion bombardment

Contact Info

Product

Resources

About

Anti-oxidation high-performance solution-processed Ni plasmonic nanochain-SiO_xselective solar thermal absorbers

Anti-oxidation high-performance solution-processed Ni plasmonic nanochain-SiO_xselective solar thermal absorbers