Formation of silicon nitride nanopillars in dual-frequency capacitively coupled plasma and their application to Si nanopillar etching

Park, C. K.; Kim, H. T.; Kim, D. Y.; Lee, Nae‐Eung

doi:10.1116/1.2713116

Cited by 5 publications

(2 citation statements)

References 26 publications

(19 reference statements)

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“…Using the "additive mode" on the other hand, several groups have also demonstrated assembly of random nanostructures from depositing plasmas. In fact silicon and other inorganic material nano-grass growth by plasmas is a very active field as evidenced by several publications (14), (15), (16)(17)(18) including a recent review (19). Plasma has thus been proven to direct the assembly of both inorganic nanostructures (20), (19), and organic nanostructures (1),(2), while it has been claimed that plasma nanofabrication mimics nature in the creation of the cosmos (21).…”

Section: Introductionmentioning

confidence: 99%

Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials

Gogolides¹,

Constantoudis²,

Kokkoris³

et al. 2011

J. Phys. D: Appl. Phys.

118

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We describe how plasma-wall interactions in etching plasmas lead to either random roughening / nanotexturing of polymeric and Silicon surfaces, or formation of organized nanostructures on such surfaces. We conduct carefully designed experiments of plasma-wall interactions to understand the causes of both phenomena, and present Monte-Carlo simulation results confirming the experiments. We discuss emerging applications in wetting and optical property control, protein adsorption, microfluidics and lab-on-a-chip fabrication and modification, and cost-effective silicon mold fabrication. We conclude with an outlook on the plasma reactor future designs to take advantage of the observed phenomena for new micro and nanomanufacturing processes.

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Section: Introductionmentioning

confidence: 99%

Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials

Gogolides¹,

Constantoudis²,

Kokkoris³

et al. 2011

J. Phys. D: Appl. Phys.

118

View full text Add to dashboard Cite

show abstract

“…In addition they have used plasmas to control the growth of nanotips [10], and have tried to offer some theoretical explanations of the observed assembly phenomena during plasma deposition [11]. Other groups have used simultaneous plasma deposition and etching to create nanotips [12][13][14]. Recently our group has used plasma etching of organic or inorganic polymers in oxygen or fluorine .…”

Section: Introductionmentioning

confidence: 99%

Plasma directed assembly and organization: bottom-up nanopatterning using top-down technology

et al. 2010

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Fabrication of periodic nanodot or nanocolumn arrays on surfaces is performed by top-down lithographic procedures or bottom-up self-assembly methods, which both make use of plasma etching to transfer the periodic pattern. Could plasma etching alone act as an assembly--organization method to create the pattern and then transfer it to the substrate? We present data that support this idea and propose a mechanism of periodicity formation where etching and simultaneous deposition take place.

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Vertical nanostructure arrays by plasma etching for applications in biology, energy, and electronics

Yang

Yuen

et al. 2013

Nano Today

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Formation of silicon nitride nanopillars in dual-frequency capacitively coupled plasma and their application to Si nanopillar etching

Cited by 5 publications

References 26 publications

Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials

Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials

Plasma directed assembly and organization: bottom-up nanopatterning using top-down technology

Vertical nanostructure arrays by plasma etching for applications in biology, energy, and electronics

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