2014
DOI: 10.1002/pssc.201300620
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Formation of indium tin oxide transparent electrodes by magnetron sputtering for II‐VI compound semiconductor optical devices on InP substrates

Abstract: Indium tin oxide (ITO) transparent electrodes formed on II‐VI compound semiconductor optical devices on InP substrates were characterized. Two kinds of ZnCdSe/BeZnTe p‐n diode devices with a different p‐contact layer (i.e., p‐ZnTe and p‐ZnSeTe layers) were prepared to investigate more suitable p‐contact material for ITO electrodes on the II‐VI devices. Thin ITO layers were deposited on the devices by magnetron sputtering. From injection current density versus applied voltage (J‐V) characteristics, the turn‐on … Show more

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“…In this device, however, the ZnTe p-contact was adopted because it is very effective for making low resistivity contacts with ITO, as described in Section 2 and Ref. [17]. The III-V and II-VI layers of the devices were grown on S-doped (100) n-InP substrates using a double chamber MBE system (SVP-1120, Seiko) comprising the II-VI and III-V growth chambers connected via an ultrahigh-vacuum transfer (UVT) chamber, and a load lock chamber.…”
Section: Ld Structure Analysismentioning
confidence: 99%
“…In this device, however, the ZnTe p-contact was adopted because it is very effective for making low resistivity contacts with ITO, as described in Section 2 and Ref. [17]. The III-V and II-VI layers of the devices were grown on S-doped (100) n-InP substrates using a double chamber MBE system (SVP-1120, Seiko) comprising the II-VI and III-V growth chambers connected via an ultrahigh-vacuum transfer (UVT) chamber, and a load lock chamber.…”
Section: Ld Structure Analysismentioning
confidence: 99%