“…The filling of macroporous silicon with Cu by electrodeposition has been investigated by the group of Föll, 568 by Fukami et al 569 and other groups. [570][571][572] Föll et al reported the successful complete filling of macropores exhibiting an aspect ratio of 75 (pore-diameter, 2 µm; pore-length, 150 µm). The porous silicon templates have been post-treated by sonication in CuSO 4 -solution and subsequently dipped in Piranha solution leading to a quite thick oxide layer of about 10 nm Electrodeposition of Au, Pt, and Pd into macropores has been shown by Fukami et al, 569 whereas Pd and Pt starts growing from the pore bottom but for the deposition of Au no condition could be found to achieve this behavior.…”