2007
DOI: 10.1016/j.jcrysgro.2006.11.090
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Formation mechanism of rotational twins in beam-induced lateral epitaxy on (1 1 1)B GaAs substrate

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Cited by 3 publications
(2 citation statements)
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References 9 publications
(11 reference statements)
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“…Interestingly, the faults become less prevalent in films grown under the Garich conditions that stabilize the ͱ 19ϫ ͱ 19 reconstruction. [13][14][15] A similar trend is found for the initial structures of GaAs nanowires grown by using masks ͑selective-area growth͒. 16 The reconstruction may thus be a key to controlling stacking faults in GaAs films and nanowires.…”
supporting
confidence: 55%
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“…Interestingly, the faults become less prevalent in films grown under the Garich conditions that stabilize the ͱ 19ϫ ͱ 19 reconstruction. [13][14][15] A similar trend is found for the initial structures of GaAs nanowires grown by using masks ͑selective-area growth͒. 16 The reconstruction may thus be a key to controlling stacking faults in GaAs films and nanowires.…”
supporting
confidence: 55%
“…This is qualitatively consistent with the experimentally observed trends. [13][14][15][16] Although this simple argument neglects detailed growth processes and the distinction between nanowires and films, it illustrates how the reconstruction may suppress stacking faults in GaAs.…”
mentioning
confidence: 99%