1996
DOI: 10.1016/0039-6028(96)00029-5
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Formation conditions and atomic structure of the Si(111)-√19 Ni surface

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Cited by 32 publications
(16 citation statements)
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“…4 R ×°and (1 1) RC × − phases [13][14][15][16][17]. The last two phases are the most likely intermediate steps to epitaxial growth of 3D NiSi 2 onto Si (111) [18,19,20]. On Si (001), depending on the Ni coverage and thermal annealing conditions, several nickel-silicide compounds can be formed [22].…”
Section: Introductionmentioning
confidence: 99%
“…4 R ×°and (1 1) RC × − phases [13][14][15][16][17]. The last two phases are the most likely intermediate steps to epitaxial growth of 3D NiSi 2 onto Si (111) [18,19,20]. On Si (001), depending on the Ni coverage and thermal annealing conditions, several nickel-silicide compounds can be formed [22].…”
Section: Introductionmentioning
confidence: 99%
“…Af ter annea l i ng at 8 reconstruc ti on was devel oped l ocal l y on the cost of 1 È 1 -RC one. In our exp eri ment sil i cide i slands were not vi sibl e at very l ow covera ges, pro babl y because the cool ing ra te of ab out 2 0 £ C/ s was to o fa st [4,8]. STS was empl oyed to del i ver inf orm ati on about density of electro ni c states of the observed f orm atio ns.…”
Section: R Esu L T S An D Discussionmentioning
confidence: 65%
“…However thi s i nterpreta ti on seems to b e i nconsistent wi th the mo del of p 1 9 È p 1 9 uni t cell structure [4]. The p eak at +0 .8 eV corresp onds to the bi ndi ng energy of the Ni Si2 .…”
mentioning
confidence: 76%
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