Focused ion beam induced deposition of tungsten on vertical sidewalls

Abstract

We have observed focused ion beam (FIB) induced deposition of tungsten on vertical sidewalls. This phenomenon allows high aspect ratio structures such as deep holes to fill with greater efficiency than expected from yields measured when the ion beam is at normal incidence to the surface. However we have also observed indirect deposition on vertical sidewalls which face a clear defect (an area which is missing x-ray absorber) on an x-ray mask that had to be repaired by depositing x-ray absorbing material. Since tungsten is used for both IC microstructuring and x-ray mask repair, deposition on vertical sidewalls can be exploited for certain repair processes on these structures. However we also propose ways of reducing the effect when deposition distorts facing vertical sidewalls on x-ray masks.

Focused-ion-beam-induced deposition of superconducting nanowires

“…14 The IBID deposited films from W(CO) 6 and Ga-source FIB are commonly available options in commercial FIB facilities, and therefore their physical and structural characteristics have been extensively studied in the past. [15][16][17][18][19][20][21][22][23] However, their properties at low temperatures have not been reported before this work. In these deposition conditions, the nominal film composition is expected to be mainly Tungsten metal, which has a superconducting 3 transition temperature of 0.01 K for bulk single crystals.…”

Resistivity change of the diamondlike carbon, deposited by focused-ion-beam chemical vapor deposition, induced by the annealing treatment

“…1 It also allows us to deposit various materials such as diamondlike carbon ͑DLC͒, 1,2 tungsten, [3][4][5] and SiO x , 6,7 by changing the gas source. FIB-CVD can be used to fabricate arbitrary 3D structures such as wine glasses, bellows, and coils at any local position.…”

Non-Core–Shell Nanostructure Deposition on Focused-Ion-Beam Chemical Vapor Deposition

“…Focused-ion-beam chemical vapor deposition (FIB-CVD) enabled us to fabricate arbitrary three-dimensional (3D) nano-and microstructures. FIB-CVD has the following attractive features: (1) arbitrary 3D structures such as wine glasses, bellows, and coils 1) can be fabricated by this technique and (2) various materials such as diamond-like carbon (DLC), [1][2][3] tungsten (W), [4][5][6] and silicon oxide (SiO x ) 7,8) can be deposited by changing the CVD gas source. Therefore, FIB-CVD can potentially be used to realize novel nano-and micro-electromechanical devices.…”