Fluorine‐doped hydrogenated carbon film was grown by chemical vapor deposition technique using CH4 and CF4 as feedstock, with a pulse DC‐bias power supply. The structure of as‐deposited film was characterized by transmission electron microscopy and Raman spectra. The results suggested that the film could be considered as composite thin film with curved graphitic structures embedded in amorphous carbon matrix. The mechanical properties and friction coefficient were tested by TI 950 TriboIndenter and UMT‐2 at humidity of 30%, respectively. The results showed that the film exhibited high hardness (~11.04 GPa), good elasticity recovery(~83%) and ultra‐low coefficient of friction (~0.01). Copyright © 2013 John Wiley & Sons, Ltd.