2007
DOI: 10.1109/soi.2007.4357895
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Flexfet¿: Independently-Double-Gated SOI Transistor With Variable Vt and 0.5V Operation Achieving Near Ideal Subthreshold Slope

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Cited by 10 publications
(7 citation statements)
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“…CMOS has moved out of "Classical (geometrically driven) Scaling" where performance was driven by new litho tools leading to smaller transistors that could be easily projected. It is now in the era of "Equivalent Scaling" where performance is driven by changes in technology such as strained silicon [31], high-K/metal gate [32], multi-gate transistors [33] and integration of germanium and compound semiconductors [34]. There is some geometric scaling but this is tapering off and by 2020 will be irrelevant.…”
Section: Equipment Power Consumption Improvements In 2020mentioning
confidence: 99%
“…CMOS has moved out of "Classical (geometrically driven) Scaling" where performance was driven by new litho tools leading to smaller transistors that could be easily projected. It is now in the era of "Equivalent Scaling" where performance is driven by changes in technology such as strained silicon [31], high-K/metal gate [32], multi-gate transistors [33] and integration of germanium and compound semiconductors [34]. There is some geometric scaling but this is tapering off and by 2020 will be irrelevant.…”
Section: Equipment Power Consumption Improvements In 2020mentioning
confidence: 99%
“…The 'gate' electrode ( Figure(2(a)) is placed above the conducting channel ,is separated from conducting channel by insulating layer. The gate creates an electric field that controls the flow of charge carriers between source and drain through that conducting channel [15]. If the dimensions of IC processes shrinks, unwanted leakage currents grows, particularly between source and drain.…”
Section: Materials and Mathodology 31 Planar Transistormentioning
confidence: 99%
“…To minimize the SCEs, multigate field effect transistors [3]- [13], such as double-gate transistors [3]- [6], Flexfets [7], and FinFETs or trigate transistors [8], were introduced. Among these structures, the FinFET technology has become a promising candidate to overcome the SCEs due to its superior performance in low-leakage and highdriving currents, compared with other technologies [9]- [11].…”
Section: Introductionmentioning
confidence: 99%